三氟化硼纯化工艺综述  

Summary of Purification Process of Boron Trifluoride

作　　者：巩晓辉 任少科[2] 常琳[2] 李子宽 赵鹏德 范正林[2] GONG Xiaohui;REN Shaoke;CHANG Lin;LI Zikuan;ZHAO Pengde;FAN Zhenglin(Zhonghao Guangming Research and Design Institute of Chemical Industry Co. , Ltd. , Dalian 116031, China)

机构地区：[1]中昊光明化工研究设计院有限公司研发中心,辽宁大连116031 [2]中昊光明化工研究设计院有限公司,辽宁大连116031

出　　处：《低温与特气》2021年第6期8-11,共4页Low Temperature and Specialty Gases

摘　　要：三氟化硼作为一种常用的气体在半导体工业中发挥着重要的作用。高纯度的三氟化硼(>4N,>99.99%)可用于高新技术行业因而具有高的附加值、重要的研究意义和工业价值。对三氟化硼工艺包括冷阱法、吸附法、化学转化法及精馏法等进行了总结。Boron trifluoride,as a commonly used gas,plays an important role in the semiconductor industry.Boron trifluo-ride(>4N,>99.99%)of high purity is of great research interest and industrial value because of its high added value for its utilization in the high technology industries.The processes of boron trifluoride,including cold trap,adsorption,chemical transformation and rectification were summarized.

关 键 词：三氟化硼 低温精馏 纯化 

分 类 号：TQ117[化学工程—无机化工]