基于数字微镜器件的无掩膜光刻技术进展  

Research progress of maskless lithography based on digital micromirror devices

作　　者：张思琪 周思翰 杨卓俊 许智[2] 兰长勇 李春 ZHANG Siqi;ZHOU Sihan;YANG Zhuojun;XU Zhi;LAN Changyong;LI Chun(School of Optoelectronic Science and Engineering,University of Electronic Science and Technology of China,Chengdu 011699,China;Songshan Lake Materials Laboratory,Institute of Physics,Chinese Academy of Sciences,Dongguan 523429,China)

机构地区：[1]电子科技大学光电科学与工程学院,四川成都011699 [2]中国科学院物理研究所松山湖材料实验室,广东东莞523429

出　　处：《光学精密工程》2022年第1期12-30,共19页Optics and Precision Engineering

基　　金：国家自然科学基金资助项目(No.61475030,No.61975024)。

摘　　要：基于空间光调制器的无掩膜光刻是光刻技术重要发展方向之一。近年来,随着数字微镜器件芯片集成度与性能的提高,数字微镜器件无掩膜光刻成为一种主要的数字光刻技术。由于可灰度调制的光反射式“数字掩膜”替代了传统光刻中使用的预制物理光掩膜版,该技术极大地简化了光刻制版流程,提高了光刻的灵活性,广泛应用于平面微纳器件、超材料、微流控器件、组织生物研究等领域。从数字无掩膜光刻原理出发,简要介绍了典型匀光照明系统结构与微缩投影系统结构,进而介绍了面向平面光刻的空间分辨率增强技术、灰度光刻技术以及三维微立体光刻技术的进展。最后,列举了几类典型的数字无掩膜光刻应用,并对其发展方向进行了展望。Maskless lithography based on spatial light modulators is an important development direction of lithography technology.In recent years,with the improvement in digital micromirror device(DMD)chip integration and performance,maskless lithography based on DMD has become the main digital lithography technology.By virtue of a programmable digital mask that can be gray-scale modulated to replace the prefabricated physical photomask used in traditional lithography,it can greatly simplify the process of lithography and improve the flexibility of lithography.It is widely used in many research fields including planar micro-nano devices,metamaterials,microfluidic device chips,and tissue biology.Starting from the principle of maskless lithography,we briefly introduce the structure of uniform illumination system and miniature projection system,and then summarize the development of spatial resolution enhancement technology for traditional planar lithography,grayscale lithography,and three-dimensional micro-stereolithography technology.Finally,we highlight the typical applications of digital maskless lithography and propose its future development direction.

关 键 词：无掩膜光刻 空间光调制器 数字微镜器件 分辨率增强 灰度光刻 微立体光刻 

分 类 号：TN305[电子电信—物理电子学]