260~520 keV Kr^(q+)(8≤q≤17)离子轰击Al靶产生的可见光辐射  

Optical Emission From the Al Surface Bombarded by 260~520 keV Kr^(q+)(8≤q≤17)Ion

作　　者：徐秋梅[1] XU Qiu-mei(Institute of Modern Physics,Chinese Academy of Sciences,Lanzhou 730000,China)

机构地区：[1]中国科学院近代物理研究所,甘肃兰州730000

出　　处：《光谱学与光谱分析》2022年第2期544-548,共5页Spectroscopy and Spectral Analysis

基　　金：国家重点研发计划材料基因工程关键技术及支撑平台重点专项(2017YFB0702202)资助。

摘　　要：低速高电荷态离子与金属表面相互作用,原子从靶材表面溅射,其中一部分处于激发态的溅射原子通过辐射退激产生可见光。在这一相互作用过程中,低速高电荷态离子从靶材表面捕获一个或多个电子进入其激发态,这些处于激发态的入射离子也会通过辐射退激产生可见光。研究表明,离子在靶材中的核阻止本领与溅射原子产额密切相关。为了更好地理解溅射原子的激发过程,认识低速高电荷态离子与金属相互作用过程中,溅射原子的激发概率与入射离子动能和势能之间的关联,研究了260~520 keV Kr^(q+)(8≤q≤17)离子与Al靶相互作用过程中的可见光发射。给出了520 keV Kr^(13+)与Al表面相互作用过程中,发射300~550 nm波长范围的发射光谱。实验结果包括溅射的Al原子在309.0和395.9 nm处的共振跃迁,Al^(+)和Al^(2+)分别在358.3和451.6 nm处的共振跃迁,以及Kr^(+)在430.0,434.1,465.8和486.0 nm处的共振跃迁。还给出了谱线强度比值Y(309.0)/Y(395.9),Y(358.5)/Y(395.9),Y(452.8)/Y(395.9)随入射离子动能和势能的变化。结果表明:谱线强度比值均随入射离子动能的增加而增大,而比值Y(309.0)/Y(395.9)随势能的增加而减小。分析表明,在低速高电荷态离子与Al靶相互作用过程中,动能(电子阻止本领)和势能共同作用导致Al原子的激发,与激发态Al(4 s)相比,电子布居较高激发态Al(3 d)的概率随着离子电子阻止本领的增加而增大,而随着离子势能增加而减小。在低速高电荷态离子与金属表面相互作用过程中,入射离子在靶材中的核阻止本领影响溅射原子产额,而电子阻止本领与激发概率相关。在这一作用过程中,动能和势能共同决定溅射原子的激发概率,当动能和势能在同一数量级时,动能作用比势能作用小两个量级。When a metal surface is bombarded by slow,highly charged ions(SHCIs),atomic particles ejected from the sample,and then some of them in excited states undergo radiative de-excitation resulting in optical emission.SHCIs will capture one or more electrons from the surface into its excited state during the interaction.Then some exciting projectiles undergo radiative de-excitation and result in the optical emission.Previous reports showed that the nuclear stopping power is closely related to the sputtering yields.In order to arrive at a better understanding of the electronic excitation of the sputtered particles,a correlation between the ion-induced photon emission and kinetic energy and potential energy is required.We have investigated the interaction between 260~520 keV Kr^(q+)(8≤q≤17)ions and an aluminum target in the present work.A spectrum in the wavelength range of 300~550 nm was obtained by 520 keV Kr^(13+)bombardment.The spectral lines included the resonance transitions of sputtered Al atoms at 309.0,395.9 nm,Al^(+) and Al^(2+) ions at 358.3 and 451.6 nm,and Kr^(+)ions at 430.0,434.1,465.8,486.0 nm.The ratio of Y(309.0)/Y(395.9),Y(358.5)/Y(395.9),Y(452.8)/Y(395.9)are presented as a function of projectile kinetic energy and potential energy.The results showed that the ratios of Y(309.0)/Y(395.9),Y(358.5)/Y(395.9),Y(452.8)/Y(395.9)increased with the increase of the kinetic energy,while the ratio Y(309.0)/Y(395.9)decreased with the increase of the potential energy.It is concluded that,in the interaction between SHCIs and Al target,the kinetic energy(electronic stopping power)and the potential energy make Al atom excitation.Compared with the excited states Al(4 s),the probability of higher excited state 3d increases with the increase of the electronic stopping power,decreases with the increase of the potential energy.In optical radiation,nuclear stopping power affects the sputtering yield,and the electronic stopping power and potential energy are closely related to the excitation probability.In the interaction

关 键 词：低速高电荷态离子 原子谱线 可见光辐射 激发概率 

分 类 号：O04[理学]