A Novel R2R Control Strategy with Virtual Structure Deployment and Rolling Wave Control Plan  

作　　者：Chang Xu 

机构地区：[1]Fujian Jinhua Integrated Circuit Co,Ltd,Jinjiang,Quanzhou,Fuyjian,China,362200

出　　处：《Journal of Microelectronic Manufacturing》2021年第3期1-6,共6页微电子制造学报（英文）

基　　金：supported by my department manager Haw-Jyue Luo for gently sharing his years of semiconductor manufacturing experience.

摘　　要：This paper presents an innovative R2R(run to run)control strategy.This novel approach has made use of circuit design structure through virtually put up the structure before reach the actual structure developing step.The most significant difference between this approach and other R2R control strategies is this approach can solve issues caused by limitation of metrology instrument such as measuring target is inside a deep hole and cannot be measured clearly.Furthermore,the study proposed a multi-steps rolling wave control plan to safeguard the outcome of this control strategy.Although this control strategy has only performed trials on DRAM(Dynamic Random Access Memory)manufacturing process but it can be applied to other industry as well.

关 键 词：R2R MANUFACTURING control circuit design virtual metrology 

分 类 号：TP3[自动化与计算机技术—计算机科学与技术]