Absolute characterization of high numerical aperture microscope objectives utilizing a dipole scatterer  

作　　者：Jörg S.Eismann Martin Neugebauer Klaus Mantel Peter Banzer 

机构地区：[1]Institute of Physics,University of Graz,NAWI Graz,Universitätsplatz 5,8010 Graz,Austria [2]Max Planck Institute for the Science of Light,Staudtstr.2,91058 Erlangen,Germany [3]Institute of Optics,Information and Photonics,University Erlangen-Nuremberg,Staudtstr.7/B2,91058 Erlangen,Germany

出　　处：《Light(Science & Applications)》2021年第12期2342-2348,共7页光（科学与应用)（英文版）

摘　　要：Measuring the aberrations of optical systems is an essential step in the fabrication of high precision optical components.Such a characterization is usually based on comparing the device under investigation with a calibrated reference object.However,when working at the cutting-edge of technology,it is increasingly difficult to provide an even better or well-known reference device.In this manuscript we present a method for the characterization of high numerical aperture microscope objectives,functioning without the need of calibrated reference optics.The technique constitutes a nanoparticle,acting as a dipole-like scatterer,that is placed in the focal volume of the microscope objective.The light that is scattered by the particle can be measured individually and serves as the reference wave in our system.Utilizing the well-characterized scattered light as nearly perfect reference wave is the main idea behind this manuscript.

关 键 词：CHARACTERIZATION SCATTER SCATTERED 

分 类 号：TH742[机械工程—光学工程]