DC-RF混合等离子体温度及流场的数值计算  

Numerical Calculation on Temperature and Flow Field Distribution of DC-RF Plasma

作　　者：陈文波[1] 冯军[1] 陈伦江[2] 阳璞琼[1] 刘川东[2] CHEN Wenbo;FENG Jun;CHEN Lunjiang;YANG Puqiong;LIU Chuandong(College of Electrical Engineering,University of South China,Hengyang 421001,China;Southwestern Institute of Physics,Chengdu 610041,China)

机构地区：[1]南华大学,衡阳421001 [2]核工业西南物理研究院,成都610041

出　　处：《真空科学与技术学报》2021年第12期1191-1197,共7页Chinese Journal of Vacuum Science and Technology

基　　金：国家磁约束核聚变能发展研究专项项目(2019YFE03070000);国家自然科学基金面上项目(11675074);国家自然科学基金青年科学基金项目(11805058)。

摘　　要：直流-射频(DC-RF)混合等离子体在材料合成领域有着较大的优势。为了对这种混合等离子体的特性进行分析,本文采用基于磁流体力学方程的DC-RF等离子体模型,数值分析了操作参数的改变对混合等离子体流场的影响效应。计算结果表明,直流电弧电流及工作气体流量的增加,主要使反应室中心区域处的混合等离子体轴向速度增加,并改变该区域内的温度及流场分布。但对反应室出口位置处的速度及温度分布影响不大。因此,可以通过调节直流电弧电流及工作气体流量的大小来改变混合等离子体的流场分布,从而满足特定材料处理工艺的需要。The integrated direct current-radio frequency(DC-RF)plasma has great advantages in the field of material synthesis.The influence of changes in operating parameters is numerically analyzed by a direct currentradio frequency(DC-RF)plasma model based on magneto-hydrodynamic formulations.The calculated results reveal that the increase of DC arc current and working gas flow rate raises the plasma velocity in the central region of the DC-RF plasma torch and changes the distribution of temperature and flow field in the same region.But the plasma velocity and temperature profiles on the torch exit plane are little affected by the increase of DC arc current and working gas flow rate.Accordingly,the present integrated numerical analysis suggests that the DC-RF plasma flow field profiles are controllable by adjusting the DC arc current and working gas flow rate to meet the needs of specific material handling processes.

关 键 词：直流-射频 混合等离子体 温度分布 流场分布 

分 类 号：TB126[理学—工程力学]