脉冲和连续光量子级联激光器在一氧化氮检测中的性能对比  被引量:1

Performance Comparison of Pulsed and Continuous Quantum Cascade Lasers in Nitric Oxide Detection

在线阅读下载全文

作  者:李振涵 俞跃[3] 郭瑞[4] Li Zhenhan;Yu Yue;Guo Rui(School of Automation,Guangdong University of Technology,Guangzhou,Guangdong 510006,China;Beijing Reyin Instrument Technology Co.,Ltd.,Beijing 100088,China;China Special Equipment Inspection And Research Institute,Beijing 100029,China;Institute of Microelectronics,Chinese Academy of Science,Beijing 100029,China)

机构地区:[1]广东工业大学自动化学院,广东广州510006 [2]北京瑞荧仪器科技有限公司,北京100088 [3]中国特种设备检测研究院,北京100029 [4]中国科学院微电子研究所,北京100029

出  处:《激光与光电子学进展》2021年第23期364-370,共7页Laser & Optoelectronics Progress

摘  要:发射中红外激光的量子级联半导体激光器(QCL)在气体分子检测,特别是氮氧化物的吸收光谱检测中有突出的应用前景。目前QCL有脉冲和连续光两种主流形式,具有不同的应用特性。采用同波长的两种激光器,搭建相应的驱动及调制解调系统,同时对一氧化氮进行测量:对脉冲QCL采用啁啾调制;对连续QCL采用正弦波调制和二次谐波解调。然后比较了两系统的光谱分辨率、测量范围、线性度、检出限、噪声等指标。结果表明,脉冲系统的测量范围为连续光系统的4.6倍,检出限为后者的2.2倍;连续光系统的线性结果较好。两种系统中,干涉效应导致的光学噪声为电子噪声的10倍,因此消除光学干涉将是该类仪器提高性能的关键。Quantum cascade semiconductor lasers(QCL) that emit mid-infrared laser has promising applications in gas molecules detection,especially nitrogen oxides detection.At present,the QCLs have two major forms:pulsed and continuous light.In this study,two nitric oxide detection system using pulsed and continuous light QCLs in the same wavelength were designed.The pulsed light system uses high pulse current to generate chirp modulation;the continuous light system uses sine waves modulation and second harmonic demodulation.The spectrum resolution,measurement range,linearity,limit of detection and other indicators are compared.The results show that the measurement range of the pulsed system is 4.6 times that of the continuous light system,and the detection limit is2.2 times that of the latter.The continuous system has better linearity.For both systems,the optical noise caused by the Etalon effect is 10 times higher than the electrical noise.So,eliminating Etalon effect will be the focus of the future instrument design.

关 键 词:光谱学 浓度测量 中红外激光 一氧化氮 可调谐激光二极管吸收光谱 

分 类 号:O433.1[机械工程—光学工程]

 

参考文献:

正在载入数据...

 

二级参考文献:

正在载入数据...

 

耦合文献:

正在载入数据...

 

引证文献:

正在载入数据...

 

二级引证文献:

正在载入数据...

 

同被引文献:

正在载入数据...

 

相关期刊文献:

正在载入数据...

相关的主题
相关的作者对象
相关的机构对象