电沉积参数对Cr_(2)O_(3)超疏水膜层表面形貌和润湿性的影响  被引量:2

Influence of Electrodeposition Conditions on the Surface Morphology and Wettability of Cr_(2)O_(3) Super-hydrophobic Layer

在线阅读下载全文

作  者:金巍 梁建[1,3] 马艳丽 张波 张世鹏[1,2,4] JIN Wei;LIANG Jian;MA Yan-li;ZHANG Bo;ZHANG Shi-peng(Key Laboratory of Comprehensive and Highly Efficient Utilization of Salt Lake Resources,Qinghai Institute of Salt Lakes,Chinese Academy of Sciences,Xining,810008,China;Key Laboratory of Salt Lake Resources Chemistry of Qinghai Province,Xining,810008,China;Qinghai Technology Research and Development Center of Comprehensive Utilization of Salt Lakes Resources,Xining,810008,China;University of Chinese Academy of Sciences,Beijing 100049,China;Duoba Town Central School,Xining,811601,China)

机构地区:[1]中国科学院青海盐湖研究所,中国科学院盐湖资源综合高效利用重点实验室,青海西宁810008 [2]青海省盐湖资源化学重点实验室,青海西宁810008 [3]青海盐湖资源综合利用技术研究开发中心,青海西宁810008 [4]中国科学院大学,北京100049 [5]多巴镇中心学校,青海西宁811601

出  处:《盐湖研究》2022年第1期77-86,共10页Journal of Salt Lake Research

基  金:青海省科技厅青年自然基金项目“基于电沉积和表面修饰的氢氧化镁超疏水材料可控构筑与性能研究”(2019-ZJ-946Q)。

摘  要:采用电沉积法在碳钢片表面制备Cr_(2)O_(3)微纳膜层,并用硬脂酸对其进行表面修饰,降低其表面能。通过单因素法依次优化电流密度、铬酸浓度、极间距和电沉积时间,分析所得Cr_(2)O_(3)超疏水膜层的表面形貌和润湿性。当电流强度为4A、铬酸浓度为1.5 mol/L、极间距为5 mm及电沉积时间为1 h时,经硬脂酸修饰后Cr_(2)O_(3)膜层的超疏水性能优异,其静态接触角达到153.52°,且滚动角为2.17°。The micro/nano film of Cr_(2)O_(3) was prepared on the surface of carbon steel sheet by electrodeposition method,then its surface energy was reduced by surface modification with stearic acid.The current density,chromic acid concentration,electrode spacing and the time of electrodeposition were optimized by single factor method,while the surface morphology and wettability of the obtained superhydrophobic films were analyzed.When the current intensity is 4A,the concentration of chromic acid 1.5 mol/L,the electrode spacing 5 mm and the electrodeposition time 1 h,the superhydrophobic performance of the Cr_(2)O_(3) films modified by stearic acid is excellent while the static contact angle reaches 153.52°and the rolling angle is 2.17°.

关 键 词:电沉积 硬脂酸修饰 超疏水 接触角 滚动角 

分 类 号:TG174[金属学及工艺—金属表面处理] TQ153[金属学及工艺—金属学]

 

参考文献:

正在载入数据...

 

二级参考文献:

正在载入数据...

 

耦合文献:

正在载入数据...

 

引证文献:

正在载入数据...

 

二级引证文献:

正在载入数据...

 

同被引文献:

正在载入数据...

 

相关期刊文献:

正在载入数据...

相关的主题
相关的作者对象
相关的机构对象