真空中的基板加热温度检测  

Measuring of Substrate Heating Temperature in Vacuum

作　　者：石晓倩 郭方准[1] SHI Xiao-qian;GUO Fang-zhun(School of Mechanical Engineering,Dalian Jiaotong University,Dalian 116028,China)

机构地区：[1]大连交通大学机械工程学院,辽宁大连116028

出　　处：《真空电子技术》2022年第1期72-75,共4页Vacuum Electronics

基　　金：辽宁省教育厅“攀登学者”项目。

摘　　要：在真空环境中进行原子级别的薄膜生长,基板的表面温度监控是关键技术之一。针对不同尺寸的基板,通过热电偶测试基板近旁的温度和红外测温仪测试基板表面的温度,经过数据拟合获得两种测试方法所得温度的对应关系,基板表面的温度与近旁温度存在偏差,但两者之间存在较好的线性比例关系。The monitoring and controlling of substrate surface temperature is one of the key technologies to grow atomic-scale thin films in vacuum. For substrates withdifferent size, the temperatures near and of the substrate surface were measured by thermocoupleand infrared thermometer respectively.The corresponding relationship between the two temperatures was obtained by data fitting. The result shows thatthere is a deviation between the two temperatures, but the linear proportional relationship is good.

关 键 词：真空加热 薄膜制备 真空温度 热辐射 电子轰击 

分 类 号：TH811[机械工程—仪器科学与技术]