基于PLC的真空离子镀膜机控制系统设计  

PLC-based Control System Design for Vacuum Ion Coating Machine

作　　者：张羽洲 Zhang Yuzhou(Southwest Institute of Physics of Nuclear Industry,Chengdu Sichuan 610000)

机构地区：[1]核工业西南物理研究院,四川成都610000

出　　处：《机械管理开发》2022年第2期283-284,287,共3页Mechanical Management and Development

摘　　要：真空离子磁控溅射镀膜是一种被广泛使用的镀膜工艺,具有工艺质量好、操作简便、控制灵活等优势。因此,探讨了基于PLC的真空离子磁控溅射镀膜机的控制系统结构和软硬件设计。该系统可实现真空离子磁控溅射镀膜机的逻辑控制和数据处理,以及自动化操作,提高镀膜工艺控制水平。Vacuum ion magnetron sputtering coating is a widely used coa ting process with the advantages of good process quality,easy operation and flexible control.The control system structure and software and hardware design of the PLC-based vacuum ion magnetron sputtering coater are discussed to realize the logic control and data processing of the vacuum ion magnetron sputtering coater and to realize the automatic operation in order to improve the control of the coating process.

关 键 词：PLC真空镀膜机 真空离子磁控溅射 离子镀膜 

分 类 号：TP273[自动化与计算机技术—检测技术与自动化装置]