Post-treatment of 351 nm SiO_(2) antireflective coatings for high power laser systems prepared by the sol-gel method  

作　　者：Bin Shen Huai Xiong Xu Zhang Zhiya Chen Xiangyang Pang Yajing Guo Chengjie Liang Haiyuan Li 沈斌;熊怀;张旭;陈知亚;庞向阳;郭亚晶;梁成杰;李海元(Key Laboratory of High Power Laser and Physics,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China;Center of Materials Science and Optoelectronics Engineering,University of Chinese Academy of Sciences,Beijing 100049,China)

机构地区：[1]Key Laboratory of High Power Laser and Physics,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China [2]Center of Materials Science and Optoelectronics Engineering,University of Chinese Academy of Sciences,Beijing 100049,China

出　　处：《Chinese Optics Letters》2022年第1期89-93,共5页中国光学快报（英文版）

基　　金：supported by the Strategic Priority Research Program of Chinese Academy of Sciences (No. XDA25020305)

摘　　要：Different post-treatment processes involving the use of ammonia and hexamethyldisilazane(HMDS) were explored for application to 351 nm third harmonic generation SiO_(2)antireflective(3ω SiO_(2)AR) coatings for high power laser systems prepared by the sol-gel method.According to experimental analysis,the 3ω SiO_(2)AR coatings that were successively post-treated with ammonia and HMDS at 150℃ for 48 h and again heat-treated at 180℃ for 2 h(N/H 150+180 AR) were relatively better.There were relatively fewer changes in the optical properties of the N/H 150+180 AR coating under a humid and polluted environment,and the increase in defect density was slow in high humidity environments.The laser-induced damage threshold of the N/H 150+180 AR coating reached 15.83 J/cm;(355 nm,6.8 ns),a value that meets the basic requirements of high power laser systems.

关 键 词：optical materials antireflection coatings SOL-GEL optics at surfaces laser damage thin films optical properties 

分 类 号：TB383.2[一般工业技术—材料科学与工程] O43[机械工程—光学工程]