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作 者:李碧晗 詹华[1,2] 吴佳亿 刘继彬 汪瑞军[1,2] LI Bihan;ZHAN Hua;WU Jiayi;LIU Jibin;WANG Ruijun(Chinese Academy of Agricultural Mechanization Sciences Group Co.,Ltd.,Beijing 100083,China;State Key Laboratory of Soil-Plant-Machinery System Technology,Beijing 100083,China;Beijing Golden Wheel Special Machine Co.,Ltd.,Beijing 100083,China)
机构地区:[1]中国农业机械化科学研究院集团有限公司,北京100083 [2]土壤植物机器系统技术国家重点实验室,北京100083 [3]北京金轮坤天特种机械有限公司,北京100083
出 处:《新技术新工艺》2022年第3期1-4,共4页New Technology & New Process
基 金:国家国防科技工业局项目(JPPT-135-GH-2-101)。
摘 要:采用电弧离子镀技术在高速钢表面制备CrN薄膜,研究直流偏压对CrN薄膜结构和性能的影响。利用冷场发射扫描电镜和X射线衍射仪对薄膜的表面形貌和微观结构进行分析,利用球坑仪、显微硬度计以及多功能材料表面性能试验仪等,对薄膜的厚度、硬度以及结合力进行研究。结果表明,在不同直流偏压下,薄膜均由CrN相组成。当直流偏压从-60 V增加到-80 V时,薄膜表面大颗粒数数量和尺寸明显减少,沉积速率、硬度和结合力增加;但当直流偏压幅值继续增加时,薄膜表面大颗粒的数量和尺寸随之增加,沉积速率、硬度和结合力随之降低。当直流偏压为-80 V时,薄膜的表面形貌、沉积速率、硬度和结合力最佳。CrN thin films were prepared on the surface of HSS by using arc ion plating technology,and the structures and properties of the films affected by DC bias voltage were studied.The surface morphology and microstructure of the films were analyzed with cold field emission scanning electron microscopy and X-ray diffractometer.The thickness,hardness and adhesion strength of the films were analyzed by using ball pit tester,micro-hardness tester,multifunctional material surface property tester and so on.The results showed that the films were composed of CrN phase at different DC bias voltages.When the DC bias voltage changed from-60 V to-80 V,the number and size of large particles on the film surfaces decreased significantly,and the deposition rate,hardness and adhesion strength of the films increased.However,when the DC bias voltage amplitude continued to increase,the number and size of large particles on the film surfaces increased,but the deposition rate,hardness and adhesion strength of the films accordingly lowered.According to the experiments,the surface morphology,deposition rate,hardness and adhesion strength of the films were best at-80 V DC bias voltage.
关 键 词:直流偏压 CRN薄膜 表面形貌 微观结构 沉积速率 力学性能
分 类 号:TG174.4[金属学及工艺—金属表面处理]
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