WO_(3)/NiWO_(4)复合薄膜的制备及其光电化学性能  

Preparation and Photoelectrochemical Properties of WO_(3)/NiWO_(4) Composite Film

作　　者：于舒睿 王蓟[1] 杨继凯[1] 王国政[1] 杨雪[1] 聂德财 李思远 YU Shurui;WANG Ji;YANG Jikai;WANG Guozheng;YANG Xue;NIE Decai;LI Siyuan(School of Physics,Changchun University of Science and Technology,Changchun 130022,CHN)

机构地区：[1]长春理工大学物理学院,长春130022

出　　处：《半导体光电》2022年第1期137-142,共6页Semiconductor Optoelectronics

基　　金：吉林省科技厅技术攻关项目(20190302125GX);吉林省科技厅重大科技专项项目(20200501006GX);吉林省科技厅项目(20200201077JC)。

摘　　要：采用两步水热法在导电玻璃(FTO)上制备了WO_(3)/NiWO_(4)复合薄膜。通过XRD,SEM表征了WO_(3)/NiWO_(4)复合薄膜的组成结构及微观形貌,利用UV-Vis、光电流测试、光电催化测试和交流阻抗测试分析了WO_(3)/NiWO_(4)复合薄膜的光电性能。结果表明:WO_(3)/NiWO_(4)复合薄膜相较于WO_(3)薄膜具有更好的光吸收特性、光电流密度和光电催化活性,其中水热反应3 h的WO_(3)/NiWO_(4)复合薄膜的光电化学性能最佳。WO_(3)/NiWO_(4)-3 h在1.4 V(vs.Ag/AgCl)时的光电流密度为1.94 mA/cm^(2),光电催化210 min对亚甲基蓝溶液的降解效率为57.1%。交流阻抗图谱表明WO_(3)/NiWO_(4)薄膜的电荷转移电阻小于WO_(3)薄膜,光电化学性能更优。A two-step hydrothermal method was applied to create WO_(3)/NiWO_(4)composite films on conductive glass(FTO).The structure and morphology of WO_(3)/NiWO_(4)composite films were characterized by XRD and SEM.The photoelectric properties of WO_(3)/NiWO_(4)composite films were analyzed by UV-VIS,photocurrent test,photoelectrocatalytic test and AC impedance test.The analysis results indicate that the WO_(3)/NiWO_(4)composite film has better light absorption characteristics,photocurrent density and photoelectrocatalysis activity than WO_(3)film,and the WO_(3)/NiWO_(4)composite film with 3 hours hydrothermal reaction has the best photoelectrochemical properties.The photocurrent density of WO_(3)/NiWO_(4)-3 h was 1.94 mA/cm^(2)at 1.4 V(vs.Ag/AgCl),and the photoelectrocatalytic efficiency of WO_(3)/NiWO_(4)-3 h for methylene blue solution was 57.1%for 210 min.The AC impedance diagram reveals that the charge transfer resistance of WO_(3)/NiWO_(4)film is less than that of WO_(3)film,which corresponds to improved photoelectrochemical properties.

关 键 词：WO_(3)NiWO_(4)复合薄膜 光电流 光电催化 

分 类 号：O643[理学—物理化学]