化学镀Co-P和Co-Mo-P薄膜的结构与耐腐蚀性能  

Structure and Corrosion Resistance of Electroless Co-P and Co-Mo-P Thin Films

作　　者：吴芳 王伟 WU Fang;WANG Wei(College of Artificial Intelligence,Henan Finance University,Zhengzhou 450046,China;College of Information Engineering,Zhengzhou University of Technology,Zhengzhou 450044,China)

机构地区：[1]河南财政金融学院人工智能学院,河南郑州450046 [2]郑州工程技术学院信息工程学院,河南郑州450044

出　　处：《电镀与精饰》2022年第4期7-10,共4页Plating & Finishing

摘　　要：采用化学镀技术制备Co-Mo-P薄膜,并制备Co-P薄膜作为对照。采用扫描电镜、X射线衍射仪和电化学工作站对薄膜的表面形貌、相结构和耐腐蚀性能进行表征与测试,结果表明:Co-P和Co-Mo-P薄膜表面形貌相似,且都呈现(210)晶面择优取向。与Co-P薄膜相比,Co-Mo-P薄膜的腐蚀电位正移约23 mV,腐蚀电流密度降低60.5%,电荷转移电阻提高236.8Ω·cm^(2)。Co-Mo-P薄膜表现出较好的耐腐蚀性能。Co-Mo-P thin film was prepared by electroless plating,and Co-P thin film was also prepared as a comparison. The surface morphology,phase structure and corrosion resistance of the thin films were characterized by scanning electron microscopy,X-ray diffractometer and electrochemical workstation. The results showed that the surface morphology of Co-P and Co-Mo-P films were similar,and both showed a(210)crystal plane preferred orientation. The Co-Mo-P film showed better corrosion resistance compared with Co-P film,the corrosion potential was increased about 23 mV,corrosion current density was reduced by 60.5%,charge transfer resistance increased by 236.8 Ω·cm^(2).

关 键 词：Co-P薄膜 Co-Mo-P薄膜 相结构 耐腐蚀性能 

分 类 号：TQ153[化学工程—电化学工业]