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作 者:Shanshan Qin Gaozhi Ou Biao Wang Zheyu Li Rui Hu Ying Li Yunhuang Yang
机构地区:[1]Key Laboratory of Magnetic Resonance in Biological Systems,State Key Laboratory of Magnetic Resonance and Atomic and Molecular Physics,National Center for Magnetic Resonance in Wuhan,Wuhan Institute of Physics and Mathematics,Innovation Academy for Precision Measurement Science and Technology,Chinese Academy of Sciences-Wuhan National Laboratory for Optoelectronics,Huazhong University of Science and Technology,Wuhan 430071,China [2]University of Chinese Academy of Sciences,Beijing 10049,China [3]School of Physical Education,China University of Geosciences,Wuhan 430074,China
出 处:《Chinese Chemical Letters》2022年第2期987-989,共3页中国化学快报(英文版)
基 金:financial support from the National Natural Science Foundation of China (Nos.21904139,22074152,21735007);Chinese Academy of Sciences (Nos.Y9Y1041001,YJKYYQ20170026)。
摘 要:Traditional soft lithography based PDMS device fabrication requires complex procedures carried out in a clean room. Herein, we report a photolithography-free method that rapidly produces PDMS devices in 30 min. By using a laser cutter to ablate a tape, a male photoresist mold can be obtained within 5 min by a simple heating-step, which offers significant superiority over currently used photolithographybased method. Since it requires minimal energy to cut the tape, our fabrication strategy shows good resolution(~ 100 μm) and high throughput. Furthermore, the micro-mold height can be easily controlled by changing the tape types and layers. As a proof-of-concept, we demonstrated that the fabricated PDMS devices are compatible with biochemical reactions such as quenching reaction of KI to fluorescein and cell culture/staining. Collectively, our strategy shows advantages of low input, simple operation procedure and short fabrication time, therefore we believe this photolithography-free method could serve as a promising way for rapid prototyping of PDMS devices and be widely used in general biochemical laboratories.
关 键 词:MICROFLUIDICS PDMS Photolithography-free Rapid prototyping Laser cutting Soft lithography
分 类 号:TN305.7[电子电信—物理电子学]
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