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作 者:李世江 闫淑芳[1] 陈伟东[1,2] 马文 Li Shijiang;Yan Shufang;Chen Weidong;Ma Wen(School of Materials Science and Engineering,Inner Mongolia University of Technology,Hohhot 010051,China;Inner Mongolia Key Laboratory of Thin Film and Coatings Technology,Hohhot 010051,China)
机构地区:[1]内蒙古工业大学材料科学与工程学院,内蒙古呼和浩特010051 [2]内蒙古自治区薄膜与涂层重点实验室,内蒙古呼和浩特010051
出 处:《稀有金属材料与工程》2022年第3期793-799,共7页Rare Metal Materials and Engineering
基 金:National Natural Science Foundation of China(51964035);Natural Science Foundation of Inner Mongolia Autonomous Region(2019MS05020,2020LH05017);Science and Technology Major Project of Inner Mongolia Autonomous Region(2018-810)。
摘 要:利用微弧氧化技术在电解液中加入不同含量的铈,制备了阻氢性能良好的二氧化铈稳定氧化锆(ceria-stabilized zirconia,CSZ)陶瓷膜。利用涂层测厚仪、涂层附着力自动划痕仪、扫描电子显微镜、X射线能谱仪、X射线衍射仪、X射线光电子能谱仪和真空脱氢实验对膜层的厚度、结合力、形貌、相结构、元素化学价态和膜层的阻氢性能进行了测试和表征。结果表明:CSZ陶瓷膜主要由单斜相氧化锆(m-ZrO_(2))、四方相氧化锆(t-ZrO_(2))和t-Zr_(0.82)Ce_(0.18)O_(2)组成。随铈浓度的增加,膜层厚度逐渐增加。当铈浓度为9mol%时,陶瓷膜厚度为135.5μm,结合力为52.46 N,膜层具有优异的阻氢性能,阻氢渗透因子为19。铈的加入抑制了t-ZrO_(2)向m-ZrO_(2)的相转变,促进了高温稳定t-ZrO_(2)的生成。The ceria-stabilized zirconia(CSZ)coating with an excellent hydrogen resistance performance was prepared by micro-arc oxidation(MAO)with cerium addition.The thickness,bonding strength,morphology,phase structure,chemical valence,and hydrogen resistance of ceramic coatings were investigated by coating thickness gauge,auto-scratch tester,scanning electron microscopy,energy dispersive X-ray spectrometer,X-ray diffraction,and X-ray photoelectron spectroscopy,and vacuum dehydrogenation experiment.Results show that CSZ ceramic coatings are mainly composed of monoclinic zirconia(m-ZrO_(2)),tetragonal zirconia(t-ZrO_(2)),and t-Zr_(0.82)Ce_(0.18)O_(2).With increasing the cerium content,the thickness of coating is increased.When the cerium content is 9mol%,the thickness of CSZ ceramic coating reaches the maximum of 135.5μm,the bonding force is 52.46 N,and the hydrogen permeation reduction factor(PRF)is 19,which indicates an excellent hydrogen resistance.The cerium addition inhibits the phase transformation from t-ZrO_(2) to m-ZrO_(2),thereby promoting the formation of stable t-ZrO_(2) at elevated temperatures.
分 类 号:TG174.4[金属学及工艺—金属表面处理]
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