Morphological and structural damage investigation of nanostructured molybdenum fuzzy surface after pulsed plasma bombardment  

作　　者：Yu-Chuan Luo Rong Yan Guo Pu Hong-Bin Wang Zhi-Jun Wang Chi Yang Li Yang Heng-Xin Guo Zhi-Bing Zhou Bo Chen Jian-Jun Chen Fu-Jun Gou Zong-Biao Ye Kun Zhang 罗玉川;鄢容;蒲国;王宏彬;王志君;杨驰;杨黎;郭恒鑫;周志兵;陈波;陈建军;芶富均;叶宗标;张坤(Key Laboratory of Radiation Physics and Technology of the Ministry of Education,Institute of Nuclear Science and Technology,Sichuan University,Chengdu 610064,China;Institute of Plasma Physics,Hefei Institutes of Physical Science,Chinese Academy of Sciences,Hefei 230031,China;Institute for Advanced Study,Chengdu University,2025 Chengluo Avenue,Chengdu 610106,China)

机构地区：[1]Key Laboratory of Radiation Physics and Technology of the Ministry of Education,Institute of Nuclear Science and Technology,Sichuan University,Chengdu 610064,China [2]Institute of Plasma Physics,Hefei Institutes of Physical Science,Chinese Academy of Sciences,Hefei 230031,China [3]Institute for Advanced Study,Chengdu University,2025 Chengluo Avenue,Chengdu 610106,China

出　　处：《Chinese Physics B》2022年第4期468-480,共13页中国物理B（英文版）

基　　金：Project supported by the Sichuan Provincial Science and Technology Program,China(Grant Nos.2021YFSY0015and 2021YJ0510);the China Postdoctoral Science Foundation(Grant No.2019M663487);the National Natural Science Foundation of China(Grant No.11905151)。

摘　　要：Steady high-flux helium(He)plasma with energy ranging from 50 eV to 90 eV is used to fabricate a fiber-form nanostructure called fuzz on a polycrystalline molybdenum(Mo)surface.Enhanced hydrogen(H)pulsed plasma in a wide power density range of 12 MW/m^(2)-35 MW/m^(2)is subsequently used to bombard the fuzzy Mo,thereby simulating the damage of edge localized mode(ELM)to fuzz.The comparisons of surface morphologies,crystalline structures,and optical reflectivity between the original Mo and the Mo treated with various He^(+)energy and transient power densities are performed.With the increase of He ion energy,the Mo nano-fuzz evolved density is enlarged due to the decrease of filament diameter and optical reflectivity.The fuzz-enhanced He release should be the consequence of crystalline growth and the lattice shrinkage inside the Mo-irradiated layers(^(2)00 nm).The fuzz induced by lower energy experiences more severe melting damage and dust release under the condition of the identical transient H plasma-bombardment.The H and He are less likely to be trapped due to aggravated melting evidenced by the enhanced crystalline size and distinct lattice shrinkage.As the transient power density rises,the thermal effect is enhanced,thereby causing the fuzz melting loss to aggravate and finally to completely disappear when the power density exceeds 21 MW/m^(2).Irreversible grain expansion results in huge tensile stress,leading to the observable brittle cracking.The effects of transient thermal load and He ion energy play a crucial role in etching Mo fuzz during ELM transient events.

关 键 词：molybdenum nanostructured fuzz pulsed-H plasma edge localized mode etching process 

分 类 号：O53[理学—等离子体物理]