2.5D空间光滤波器设计与制备  

2.5D Grayscale lithography hologram design and fabrication

作　　者：李攀 郑盼盼 卢宏 LI Pan;ZHENG Panpan;LU Hong(Wuhan National Laboratory of Optoelectronics,Huazhong University of Science and Technology,Wuhan 430074,China)

机构地区：[1]华中科技大学武汉光电国家研究中心,湖北武汉430074

出　　处：《光学技术》2022年第2期144-146,共3页Optical Technique

摘　　要：纯相位迭代全息图可以用来设计空间光滤波器。由于介质与空气存在折射率差,空间光在经过全息干板时,会产生相位变化。文章以每个像素光刻胶的高度调制相位,设计出了2.5D灰度全息空间光滤波器。文章还利用电子束光刻机进行灰度曝光,制备不同高度的光刻胶,通过干法刻蚀将图案刻蚀到硅片上。对电子束曝光工艺、显影参数、刻蚀工艺等进行了优化,制备出了高衍射效率空间光滤波器,并进行了表征。The G-S hologram can be used to design spatial optical filter.Due to the refractive index difference between the medium and air,the phase of spatial light will change when it passes through the holographic plate.Based on the height modulation phase of each pixel photoresist,a 2.5 D gray-scale holographic spatial optical filter was designed.The photoresists with different heights were prepared by gray-scale electron beam lithography,and the patterns were etched onto the silicon wafer by dry etching.The electron beam lithography process,development parameters and etching process were optimized.The high diffraction efficiency spatial optical filter was fabricated and characterized.

关 键 词：全息光学 灰度曝光 空间光滤波器 

分 类 号：TN26[电子电信—物理电子学]