Fe_(3)O_(4)外延薄膜的制备与显微结构表征  

Preparation and microstructure characterization of epitaxial Fe_(3)O_(4) thin films

作　　者：高春阳 姚婷婷 江亦潇 陈春林[1,3] 马秀良 叶恒强[3] GAO Chun-yang;YAO Ting-ting;JIANG Yi-xiao;CHEN Chun-lin;MA Xiu-liang;YE Heng-qiang(Shenyang National Laboratory for Materials Science,Institute of Metal Research,Chinese Academy of Sciences,Shenyang Liaoning 110016;School of Materials Science and Engineering,University of Science and Technology of China,Shenyang Liaoning 110016;Ji Hua Laboratory,Foshan Guangdong 528200,China)

机构地区：[1]中国科学院金属研究所沈阳材料科学国家研究中心,辽宁沈阳110016 [2]中国科学技术大学材料科学与工程学院,辽宁沈阳110016 [3]季华实验室,广东佛山528200

出　　处：《电子显微学报》2022年第2期105-110,共6页Journal of Chinese Electron Microscopy Society

基　　金：国家自然科学基金资助项目(Nos.52125101,51971224);中国科学院前沿科学重点研究项目(No.QYZDY-SSW-JSC027);广东省基础与应用基础研究重大项目基金(No.2021B0301030003);季华实验室项目(No.X210141TL210)。

摘　　要：本文利用脉冲激光沉积(PLD)技术制备了Fe_(3)O_(4){001}和{111}两种薄膜。Fe_(3)O_(4){001}薄膜是在SrTiO_(3){001}基片上通过PLD沉积直接生长的(直接生长法),而Fe_(3)O_(4){111}薄膜是通过在SrTiO_(3){111}基片上PLD沉积Fe_(2)O_(3){0001}薄膜后,再通过高温还原反应而获得(还原法)。XRD和XPS的研究结果表明Fe_(3)O_(4){001}和{111}薄膜均为高纯度的单晶薄膜。透射电镜显微结构表征的结果表明,由还原法制备的Fe_(3)O_(4){111}薄膜具有较高的质量,其反相畴界密度比直接生长法制备的Fe_(3)O_(4){001}薄膜降低,主要为夹角是60°或120°的{110}型反相畴界。磁光克尔效应测试的结果表明,还原法制备的Fe_(3)O_(4){111}薄膜具有较小的矫顽力(530 Oe)和较大的饱和磁化强度。Fe_(3)O_(4){001} and {111} films have been prepared by pulsed laser deposition(PLD).The Fe_(3)O_(4){001} films were directly grown on SrTiO_(3){001} substrates by PLD deposition(direct growth method),while the Fe_(3)O_(4){111} films were obtained by PLD deposition of Fe_(2)O_(3){0001} thin films on SrTiO_(3){111} substrates,followed by the high-temperature reduction reaction(reduction method).XRD and XPS results indicate that the Fe_(3)O_(4){001} and {111} films are single-crystal films with a high purity.TEM microstructure characterizations reveal that Fe_(3)O_(4){111} films prepared by the reduction method have a higher quality,and the density of antiphase boundaries is lower than that of the Fe_(3)O_(4){001} films prepared by the direct growth method.The antiphase boundaries are mainly {110} type with an intersection angle of 60° or 120°.The results of magneto-optical Kerr effect test suggest that the Fe_(3)O_(4){111} films prepared by the reduction method have a smaller coercivity(530 Oe) and a larger saturation magnetization.

关 键 词：Fe_(3)O_(4)薄膜制备 反相畴界 显微结构 透射电子显微术 

分 类 号：N34[自然科学总论] O76[理学—晶体学]