多面体低聚倍半硅氧烷改性环氧树脂耐原子氧性能研究  

Study on atomic oxygen resistance of EP resin modified by POSS

作　　者：张宇 孙煜 Zhang Yu;Sun Yu(Composite Technology Centre,AVIC Manufacturing Technology Institute,Beijing 101300;AVIC Composite Corporation Ltd.,Beijing 101300)

机构地区：[1]中国航空制造技术研究院复合材料技术中心,北京101300 [2]中航复合材料有限责任公司,北京101300

出　　处：《化工新型材料》2022年第4期176-179,共4页New Chemical Materials

摘　　要：采用不同含量的多面体低聚倍半硅氧烷(POSS)掺杂改性环氧树脂,得到有机-无机杂化的环氧树脂体系,考察了3种不同试样在累积原子氧通量为3.39×10^(20)atoms/cm^(2)条件下的质量损失和剥蚀率,其中质量分数5%的POSS改性环氧树脂试样的质量损失和剥蚀率均最低,分别为6.55×10^(-3)g/cm^(3)和3.86×10^(-24)cm^(3)/atoms。采用扫描电子显微镜表征了原子氧辐照试验后试样的表面形貌,采用X射线光电子能谱仪分析了试验前后试样的表面元素组成及含量,发现POSS的加入可使材料表面生成具有防原子氧作用的SiO_(2)。The organic-inorganic hybrid epoxy(EP)resin systems were prepared by doping different contents of polyhedral oligomeric silsesquioxane(POSS),and compared their mass losses and erosion yields at the atomic oxygen flux level of 3.39×10^(20)atoms/cm^(2).The mass loss and erosion yield of 5wt%POSS resin were the lowest,which were 6.55×10^(-3)g/cm^(3) and 3.86×10^(-24)cm^(3)/atoms respectively.The surface morphology of the samples was characterized by scanning electron microscopy(SEM),and analysed the surface element composition and content of the samples before and after the test by X-ray photoelectron spectroscopy(XPS).It was found that POSS can produce SiO_(2) protection layer to resin under atomic oxygen atmosphere.

关 键 词：多面体低聚倍半硅氧烷 环氧树脂 耐原子氧性能 

分 类 号：TB332[一般工业技术—材料科学与工程]