等离子-物理气相沉积(PS-PVD)的材料输运行为与沉积机理研究进展  被引量:2

Research Progress on Material Transportation Behavior and Deposition Mechanism of Plasma Spray-physical Vapor Deposition(PS-PVD)

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作  者:黄璐 刘梅军 杨冠军[1] HUANG Lu;LIU Meijun;YANG Guanjun(State Key Laboratory for Mechanical Behavior of Materials,Xi’an Jiaotong University,Xi’an 710049,China)

机构地区:[1]西安交通大学金属材料强度国家重点实验室,西安710049

出  处:《中国表面工程》2022年第1期10-24,共15页China Surface Engineering

基  金:广东省重点领域研发计划(2019B010936001);中国博士后科学基金(2019M653602)资助项目。

摘  要:等离子-物理气相沉积(PS-PVD)具有制备层柱等多结构可控涂层的优异特性,但针对PS-PVD涂层结构调控的研究多局限于试错性试验,缺乏对涂层沉积与调控理论的研究,因此亟需对现有研究结果进行归纳、总结,以对PS-PVD沉积原理与涂层结构调控的进一步研究提供理论参考。针对PS-PVD所特有的涂层材料长距离输运、气液固多相态沉积过程,从涂层结构特征出发,综述PS-PVD沉积单元在经历喷枪内瞬时蒸发和喷枪外持续蒸发行为后,所进行的长距离输运行为与沉积行为的完整过程。此外,结合输运行为与沉积行为分析参数调控对沉积单元及涂层结构的影响规律,并对PS-PVD柱状结构涂层沉积机理的研究以及涂层制备技术的发展进行展望。Plasma spray-physical vapor deposition(PS-PVD)coatings are featured by adjustable structures like lamellas and columns,while a theoretical system about deposition mechanism and structure-regulation measurements is lacked.Summary of previous findings is urgently needed to provide a theoretical reference for the further research.The complete process of PS-PVD is summarized based on the structure characteristics from two aspects:the long-distance transportation behavior and the deposition mechanism with multiphase units.The deposition units are evaporated during two main stages:the instantaneous process in the nozzle and the persistent process out of the nozzle.In addition,the influence of different parameters on deposition units and coating structures is illustrated based on transportation and deposition behavior.The research on the deposition mechanism of PS-PVD columnar structure coatings and the development of coating preparation technology is prospected.

关 键 词:等离子-物理气相沉积(PS-PVD) 输运行为 沉积机理 结构调控 

分 类 号:TG156[金属学及工艺—热处理] TB114[金属学及工艺—金属学]

 

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