二硫化钼量子点/还原氧化石墨烯复合材料的制备及其光催化降解有机染料、四环素和Cr(Ⅵ)  

Preparation of Molybdenum Disulfide Quantum Dots/Reduced Graphene Oxide Composites and Their Photocatalytic Degradation of Organic Dyes,Tetracyclines and Cr(Ⅵ)

作　　者：徐一鑫[1] 王爽 全静 高婉婷 宋天群 杨梅[1] XU Yi-Xin;WANG Shuang;QUAN Jing;GAO Wan-Ting;SONG Tian-Qun;YANG Mei(School of Chemistry and Chemical Engineering,Liaoning Normal University,Dalian 116029,China)

机构地区：[1]辽宁师范大学化学化工学院,大连116029

出　　处：《应用化学》2022年第5期769-778,共10页Chinese Journal of Applied Chemistry

基　　金：辽宁省教育厅自然科学研究经费项目(No.LJ2020010);辽宁师范大学新进博士科研启动项目(Nos.203070091905,BS2020L008)资助。

摘　　要：以钼酸钠、L-半胱氨酸和氧化石墨烯为原料,采用一锅溶剂热还原法制备了二硫化钼量子点/还原氧化石墨烯(MoS_(2)QDs/rGO)复合材料,分别以罗丹明B、亚甲基蓝、四环素和Cr(Ⅵ)为目标污染物,研究了复合材料的可见光响应光催化降解性能。结果显示,MoS_(2)QDs/rGO对两种染料和Cr(Ⅵ)的光催化降解率均可达97%以上,对四环素的光催化降解率为69%;循环使用10次,对目标染料的降解率均保持在90%以上。说明MoS_(2)QDs/rGO具有良好的催化活性和稳定性。在降解体系中分别加入异丙醇、对苯醌和乙二胺四乙酸二钠捕获剂,结果显示,超氧自由基(·O_(2))是MoS_(2)QDs/rGO光催化反应的主要活性物种。Molybdenum disulfide quantum dots/reduced graphene oxide(MoS;QDs/rGO)composites were prepared by a one-pot solvothermal reduction method with sodium molybdate,L-cysteine and graphene oxide as raw materials. The photocatalytic degradation performance of photocatalysts was studied under visible light with rhodamine B(RhB),methylene blue(MB),tetracyclines(TC)and Cr(Ⅵ)as the target pollutants,respectively. MoS;QDs/rGO composites exhibit excellent photocatalytic activity and stability that are superior to molybdenum disulfide quantum dots and reduced graphene oxide. The photodegradation rates of RhB,MB and Cr(Ⅵ)are all above 97%,and those of TC are 69%. Moreover,MoS;QDs/rGO composites possess high photocatalytic stability and reusability and could be reused for ten times without significant decrease of photocatalytic activity. The photodegradation rates of the two dyes are both maintained over 90%. The photodegradation mechanism of MoS;QDs/rGO composites is studied by adding radical scavengers of isopropanol,p-benzoquinone and EDTA-2 Na,respectively. It is found that superoxide radical(·O;)is the main active species of MoS;QDs/rGO.

关 键 词：二硫化钼量子点/还原氧化石墨烯 光催化降解 有机染料 四环素 六价铬 

分 类 号：O643[理学—物理化学]