基于OpenCV的蜡染图案快速定制系统  

Rapid Customization System of Batik Pattern Based on OpenCV

作　　者：刘婷婷[1] 潘伟杰[1] 吕健[1] 梁焕超 付淑君 LIU Ting-Ting;PAN Wei-Jie;LYU Jian;LIANG Huan-Chao;FU Shu-Jun(Key Laboratory of Advanced Manufacturing Technology of the Ministry of Education,Guizhou University,Guiyang 550025,China)

机构地区：[1]贵州大学现代制造技术教育部重点实验室,贵阳550025

出　　处：《计算机系统应用》2022年第6期65-74,共10页Computer Systems & Applications

基　　金：国家自然科学基金(52065010);贵州省科技厅自然科学基金(黔科合基础[2018]1049)。

摘　　要：为实现蜡染图案的快速定制,提高蜡染图案创新设计效率,研究一种基于OpenCV计算机视觉库相关函数和Python语言的蜡染图案快速定制系统.该方法通过对蜡染图像进行形态学预处理,然后使用canny算子实现蜡染图案轮廓提取;随后用户手动选取子图案进行编码提取构型;通过Hu矩匹配自动获取纹样空间位置,结合拓扑学中的邻接图方法建立蜡染图案构型规则;提出构型规则重用方法,在已提取的构型规则上进行纹样嵌入,使用基于标识矩阵法的图案嵌入法避免轮廓重叠.该方法能够使设计结果更加丰富,有效提高了设计效率.最后通过蜡染图案设计原型系统进行蜡染图案创新设计,验证该方法的可行性.To achieve rapid customization of batik patterns and improve the efficiency in innovative design of such patterns, this study studied a rapid customization system based on the related functions of the OpenCV computer vision library and the Python language. In this method, batik images were morphologically preprocessed, and the contours of batik patterns were extracted by the Canny operator. Then, the subpatterns were selected manually to encode and extract the configuration. The spatial positions of batik patterns were obtained automatically through Hu moment matching, and the configuration rules for the batik patterns were established by the adjacent graph method in topology. A reuse method of configuration rules was proposed. Patterns were embedded onto the extracted configuration rules, and the pattern embedding method based on the identity matrix method was used to avoid contour overlap. This method could enrich the design results and effectively improve design efficiency. Finally, innovative design of batik patterns was carried out through the prototype system of batik pattern design to verify the feasibility of the method.

关 键 词：OPENCV 快速定制 构型规则 Hu矩匹配 蜡染图案 

分 类 号：TP391.41[自动化与计算机技术—计算机应用技术] TS193.3[自动化与计算机技术—计算机科学与技术]