一种小型真空弧离子源的触发放电结构优化研究  

The Optimization Study of the Trigger Structure of a Small Vacuum Arc Ion Source

作　　者：胡圣 郁杰 王亮[1,2] 李刚[1,2] HU Sheng;YU Jie;WANG Liang;LI Gang(Hefei Institution of Physical Science,Chinese Academy of Sciences,Hefei 230031,China;University of Science and Technology of China,Hefei 230026,China)

机构地区：[1]中国科学院合肥物质科学研究院,安徽合肥230031 [2]中国科学技术大学,安徽合肥230026

出　　处：《真空》2022年第2期11-16,共6页Vacuum

基　　金：智能导钻技术装备体系与相关理论研究(XDA14000000)。

摘　　要：在对一种小型触发型真空弧离子源的研究过程中发现,稳定的触发过程对真空弧离子源的主弧形成以及后续离子引出过程是至关重要的。传统触发结构为简单的触发极、绝缘体和阴极堆叠而成的“三明治”结构,触发过程为绝缘体表面的沿面放电过程,该结构若要实现稳定的触发需要很苛刻的外加条件。优化触发结构可有效提高离子源工作稳定性,降低电源要求及成本。针对以上情况,文章提出了一种新的触发放电结构,并论证了其触发放电的稳定性。On the research of a small triggered vacuum arc ion source, the trigger process is very crucial to the following processes such as arcing and extraction. The traditional trigger structure is a sandwich structure including trigger, insulator and cathode. The triggering process is the surface discharge process on the insulator surface. It needs a very rigorous condition to realize stable triggering discharge for this structure. Optimizing the trigger structure can effectively improve the stability of the ion source and reduce the cost and ability of the power source. Therefore, we propose a new trigger structure in this paper, which also demonstrates the stability of triggering discharge.

关 键 词：沿面放电 触发型真空弧离子源 触发放电 

分 类 号：O462.4[理学—电子物理学]