SiC晶片金刚石磨料凝胶抛光盘的制备与性能分析  

Preparation and Performance Analysis of Gel⁃forming Diamond Abrasive Polishing Disc for Polishing SiC Wafer

作　　者：冯凯萍 吕冰海[2] 王帅[3] 赵天晨 周兆忠 FENG Kaiping;LYU Binghai;WANG Shuai;ZHAO Tianchen;ZHOU Zhaozhong(School of Mechanical Engineering,Quzhou University,Quzhou 324000,Zhejiang,China;School of Mechanical Engineering,Zhejiang University of Technology,Hangzhou 310014,China;School of Mechanical Engineering,Zhejiang University,Hangzhou 310012,China)

机构地区：[1]衢州学院机械工程学院,浙江衢州324000 [2]浙江工业大学机械工程学院,杭州310014 [3]浙江大学机械工程学院,杭州310012

出　　处：《材料导报》2022年第12期215-223,共9页Materials Reports

基　　金：浙江省自然科学基金项目(LZY21E050004);衢州市科技项目(2019K10)。

摘　　要：针对热压成型超细金刚石微粉抛光盘抛光碳化硅晶片时易产生较深表面划痕而导致废片的问题,提出了一种基于聚乙烯醇冷冻⁃解冻凝胶成形金刚石固着磨料抛光盘的制备方法。采用力学性能测试、红外光谱、摩擦磨损、热重分析等方法对凝胶抛光盘的性能进行表征。研究表明:聚乙烯醇含量大于3%(质量分数,下同)时,聚乙烯醇⁃酚醛树脂混合胶水可以形成完整凝胶体。当聚乙烯醇含量为5%~6%时,凝胶抛光盘内部形成了大量毛细微孔,孔隙之间相互交错和联通,其抗折强度和抗拉强度最高,平均摩擦系数最大,摩擦系数稳定性最好,其磨料均匀性优于热压抛光盘。随着聚乙烯醇含量的提高,抛光盘表面被树脂结合剂覆盖,抛光盘的塑性越来越大,聚乙烯醇热解对凝胶抛光盘摩擦系数的影响增大,摩擦系数随着摩擦时间的延长开始出现热衰退现象。使用聚乙烯醇含量为5%的凝胶抛光盘抛光SiC晶片,表面平均粗糙度R_(a)小于2.5 nm,再通过化学机械抛光(CMP)后获得了表面粗糙度R_(a)小于0.5 nm的超光滑无损表面,抛光效果优于热压抛光盘。To solve the problem that ultrafine diamond powder polishing disc using hot pressing method is easy to produce deep scratch on the surface of SiC wafer,a preparation method of ultrafine diamond powder fixed abrasive polishing disc based on polyvinyl alcohol freezing and thawing gel⁃forming mechanism is proposed.The properties of the gel polishing disc were characterized by mechanical property tests,infrared spectrum,friction wear and thermogravimetric analysis.The results show that when the polyvinyl alcohol content is greater than 3wt%,the polyvinyl alcohol⁃phenolic resin mixed glue can form a complete gel.When the polyvinyl alcohol content is 5wt%-6wt%,a large number of capillary micropores are formed in the gel polishing disc,the pores are interlaced and interlinked,the gel polishing disc has the highest flexural strength and tensile strength,the highest average friction coefficient,and the best stability of friction coefficient,the uniformity of abrasives is better than that of the hot pressing polishing disc.With the increase of polyvinyl alcohol content,the surface of the gel polishing disc is covered by resin bond,and the plasticity of the gel polishing disc becomes larger,the effect of polyvinyl alcohol pyrolysis on the friction coefficient of the gel polishing disc increases,and the friction coefficient begins to reduce with the increase of friction time.The polishing contrast experiment showed that when the SiC wafer was polished by the gel polishing disc with a polyvinyl alcohol content of 5wt%,the average surface roughness R_(a) less than 2.5 nm was obtained.After the next chemical mechanical polishing(CMP)process,the surface roughness R_(a) less than 0.5 nm was obtained,and the polishing effect was better than that of the hot pressing polishing disc.

关 键 词：聚乙烯醇(PVA) 酚醛树脂(PF) 凝胶抛光盘 超细金刚石 碳化硅晶片 

分 类 号：TG74[金属学及工艺—刀具与模具] TH162[机械工程—机械制造及自动化]