Surface defects,stress evolution,and laser damage enhancement mechanism of fused silica under oxygen-enriched condition  

作　　者：Wei-Yuan Luo Wen-Feng Sun Bo Li Xia Xiang Xiao-Long Jiang Wei Liao Hai-Jun Wang Xiao-Dong Yuan Xiao-Dong Jiang Xiao-Tao Zu 罗韦媛;孙文丰;黎波;向霞;蒋晓龙;廖威;王海军;袁晓东;蒋晓东;祖小涛(School of Physics,University of Electronic Science and Technology of China,Chengdu 610054,China;Research Center of Laser Fusion,China Academy of Engineering Physics,Mianyang 621900,China)

机构地区：[1]School of Physics,University of Electronic Science and Technology of China,Chengdu 610054,China [2]Research Center of Laser Fusion,China Academy of Engineering Physics,Mianyang 621900,China

出　　处：《Chinese Physics B》2022年第5期398-406,共9页中国物理B（英文版）

基　　金：Project supported by the National Natural Science Foundation of China(Grant No.12105037);the Key Project of National Natural Science Foundation of China-China Academy of Engineering Physics Joint Foundation(Grant No.U1830204)。

摘　　要：Oxygen ions(O;)were implanted into fused silica at a fixed fluence of 1×10^(17) ions/cm^(2) with different ion energies ranging from 10 ke V to 60 ke V.The surface roughness,optical properties,mechanical properties and laser damage performance of fused silica were investigated to understand the effect of oxygen ion implantation on laser damage resistance of fused silica.The ion implantation accompanied with sputtering effect can passivate the sub-/surface defects to reduce the surface roughness and improve the surface quality slightly.The implanted oxygen ions can combine with the structural defects(ODCs and E′centers)to reduce the defect densities and compensate the loss of oxygen in fused silica surface under laser irradiation.Furthermore,oxygen ion implantation can reduce the Si-O-Si bond angle and densify the surface structure,thus introducing compressive stress in the surface to strengthen the surface of fused silica.Therefore,the laser induced damage threshold of fused silica increases and the damage growth coefficient decreases when ion energy up to30 ke V.However,at higher ion energy,the sputtering effect is weakened and implantation becomes dominant,which leads to the surface roughness increase slightly.In addition,excessive energy aggravates the breaking of Si-O bonds.At the same time,the density of structural defects increases and the compressive stress decreases.These will degrade the laser laser-damage resistance of fused silica.The results indicate that oxygen ion implantation with appropriate ion energy is helpful to improve the damage resistance capability of fused silica components.

关 键 词：fused silica oxygen ion implantation DEFECT mechanical property laser damage performance 

分 类 号：TL632[核科学技术—核技术及应用] TQ171.731[化学工程—玻璃工业]