ICP-AES法测定钕铁硼镀镍溶液中的杂质元素含量  

Determination of Impurity Elements in Nickel Plating Solution for Nd-Fe-B by Inductively Coupled Plasma Atomic Emission Spectrometry

作　　者：王晓红 杜亚静 韩卫平[1] 程星华[1] WANG Xiao-hong;DU Ya-jing;HAN Wei-ping;CHENG Xing-hua(Advanced Technology and Materials Co.Ltd.,Beijing 101318,China)

机构地区：[1]安泰科技股份有限公司,北京101318

出　　处：《材料保护》2022年第5期190-193,共4页Materials Protection

摘　　要：建立了用电感耦合等离子体发射光谱法(ICP-AES)测定钕铁硼材料镀镍溶液中镉、锰、铬、铜、铁、钙、锌、铝、钴、钕、镨和铈12种杂质元素含量的方法;确定了仪器的最佳工作参数及各元素的分析谱线;通过采用基体匹配和简单的镀液稀释消除了电镀液中大量存在的基体物质对待检测元素测定的光谱干扰。实验结果表明:本方法中12种待测元素线性关系良好,线性相关系数R>0.999,检出限为0.005~0.690μg/mL,精密度和回收率实验结果表明,本方法具有简便、快速、准确的优点,能够满足日常钕铁硼镀镍溶液中杂质元素的快速检测要求。An inductively coupled plasma atomic emission spectrometry(ICP-AES) method was developed for the determination of 12 impurity elements(Cd, Mn, Cr, Cu, Fe, Ca, Zn, Al, Co, Nd, Pr and Ce) in nickel plating solution for Nd-Fe-B. The optimum working parameters of the instrument and the analytical spectral lines of each element were determined. By using matrix matching and simple bath dilution, the spectral interference to the elements to be detected caused by a large number of matrix substances in the bath was eliminated. Results showed that the linear relationship of these 12 elements was good, the linear correlation coefficient R > 0.999, the detection limit was 0.005~0.690 μg/mL, the results of experiments of precision and recovery showed that this method had the advantages of simple, rapid and accurate, meeting the requirements of daily detection of impurity elements in Nd-Fe-B nickel plating solution.

关 键 词：ICP-AES 钕铁硼 镀镍溶液 镉、锰、铬、铜、铁、钙、锌、铝、钴、钕、镨和铈 

分 类 号：O657[理学—分析化学]