DBD等离子体作用下N掺杂缺陷二氧化钛材料的制备及其光催化性能研究  

Preparation of N-doped defective TiO_(2) under DBD plasma and study on its photocatalytic properties

作　　者：张国平 张连红 吕燕军 ZHANG Guo-ping;ZHANG Lian-hong;LV Yan-jun(College of Chemistry&Chemical Engineering,Southwest Petroleum University,Chengdu 610500,China)

机构地区：[1]西南石油大学化学化工学院,四川成都610500

出　　处：《现代化工》2022年第6期178-182,186,共6页Modern Chemical Industry

摘　　要：以氮气为氮源、氢气为放电气体,利用介质阻挡放电(DBD)等离子体成功制备了N掺杂缺陷二氧化钛材料,并通过TEM、XPS、EDS和FT-IR等表征方法对其进行分析。结果表明,改性后的二氧化钛在80 min内光催化降解亚甲基蓝溶液可达96%,光催化降解速率约为未经处理二氧化钛的3.5倍。经过4次重复使用后,光催化性能仍能达到80%。经过DBD等离子体处理后的二氧化钛材料形成了氧空位和N掺杂,氧空位能在导带下形成缺陷能级,N掺杂能够在价带上形成杂质能级,在两者协同作用下,禁带宽度从3.2 eV减小至2.88 eV,增强了可见光区域的吸收。同时,光生电子-空穴复合速率受到抑制,产生更多的羟基自由基,从而提高二氧化钛的光催化活性。A N-doped defective TiO_(2)material is successfully prepared by means of dielectric barrier discharge(DBD)plasma with nitrogen as nitrogen source and hydrogen as discharge gas.The material is characterized by TEM,XPS,EDS,and FT-IR.Experimental results show that the photocatalytic degradation of methylene blue solution by the modified TiO_(2)can reach 96%within 80 min,and the photocatalytic degradation rate is about 3.5 times that by the untreated TiO_(2).Additionally,the photocatalytic performance of N-doped defective TiO_(2)material can reach 80%after 4 cycles of repeated use.The characterization results show that oxygen vacancies and N-doping are formed in TiO_(2)material after DBD plasma treatment.Oxygen vacancies can form defect levels under the conduction band,and N-doping can form impurity levels in the valence band.Under the synergistic effect between oxygen vacancies and N-doping,the forbidden band width is reduced from 3.0 eV to 2.88 eV,which enhances the absorption in visible light region.Meanwhile,the recombination rate of photogenerated electron-hole is inhibited,which can generate more hydroxyl radicals.Therefore,the catalytic activity of TiO_(2)is improved.

关 键 词：DBD等离子体 TiO_(2)氧空位 N掺杂 协同作用 

分 类 号：TQ426[化学工程]