半导体硅片行业废水处理工程实例  

Examples of Wastewater Treatment Projects in the Semiconductor Wafer Industry

作　　者：李朋 Li Peng

机构地区：[1]江苏中电创新环境科技有限公司

出　　处：《洁净与空调技术》2022年第2期59-61,共3页Contamination Control & Air-Conditioning Technology

摘　　要：随着我国半导体行业的快速发展,碳化硅硅片行业企业也日趋增加,其生产线废水处理问题日益突出。以山东淄博某新建碳化硅硅片项目为例进行综合分析,针对其废水系统含氨废水(10 m^(3)/h)、含氟废水(15 m^(3)/h)、酸碱废水(45 m^(3)/h),分别采用折点加氯法、加钙混凝絮凝沉淀法、二级中和法的工艺进行处理。最终使出水水质满足GB 8978-1996中三级排放标准,同时运行成本低至6.16元/m^(3)。为碳化硅硅片行业废水的处理技术提供参考。With the rapid development of my country's semiconductor industry,the number of companies in the silicon carbide wafer industry is increasing,and the problem of wastewater treatment in its production lines has become increasingly prominent.This article takes a new silicon carbide wafer project in Zibo,Shandong Province as an example to conduct a comprehensive analysis,aiming at its wastewater system containing ammonia wastewater(10 m^(3)/h),fluorine wastewater(15 m^(3)/h),and acid-base wastewater(45 m^(3)/h).Respectively adopt the process of breaking point chlorination method,calcium addition coagulation flocculation sedimentation method,and two-stage neutralization method for treatment.Finally,the effluent water quality meets the GB 8978-996 third-level emission standard,and the operating cost is as low as 6.16 yuan/m^(3).Provide a reference for the treatment technology of wastewater in the silicon carbide wafer industry.

关 键 词：折点加氯 混凝絮凝 酸碱中和 

分 类 号：X703[环境科学与工程—环境工程]