51例面部化妆品接触性皮炎的斑贴试验和光斑贴试验结果分析  

Photopatch and patch test in 51 facial cosmetic contact dermatitis patients

作　　者：张朝霞[1] 庞静[1] 张雪青[1] 刘建新[1] 冉德琳 王广进[1] 杜东红[1] 潘付堂[1] 田洪青[1] 杨宝琦[1] ZHANG Zhaoxia;PANG Jing;ZHANG Xueqing;LIU Jianxin;RAN Delin;WANG Guangjin;DU Donghong;PAN Futang;TIAN Hongqing;YANG Baoqi(Shandong Provincial Hospital for Skin Diseases&Shandong Provincial Institute of Dermatology and Veneorology,Shandong First Medical University&Shandong Academy of Medical Sciences,Jinan 250022,China)

机构地区：[1]山东第一医科大学附属皮肤病医院(山东省皮肤病医院),山东省皮肤病性病防治研究所,山东济南250022

出　　处：《中国麻风皮肤病杂志》2022年第9期599-603,共5页China Journal of Leprosy and Skin Diseases

基　　金：山东省化妆品不良反应监测哨点课题(编号:2020SDADRKY07)。

摘　　要：目的:检测分析面部化妆品接触性皮炎患者常见致敏原。方法:回顾性分析我院面部化妆品接触性皮炎患者的临床资料、斑贴试验和光斑贴试验资料。结果:51例患者进行了斑贴试验,总体阳性率为96%。阳性率高的过敏源依次为:硫酸镍(47.1%)、氯化钴(35.3%)、甲基异噻唑啉酮(27.5%)、纺织染料混合物(19.6%)、没食子酸辛酯(19.6%)、松香(13.7%)、对苯二胺(13.7%)、硫柳汞(13.7%)、叔丁基氢醌(13.7%)、棓酸十二烷酯(13.7%)。46例患者完成光敏实验和光斑贴检查,14例存在光敏感(30.43%);其中UVA敏感7例(15.22%),UVB敏感8例(17.39%)。光斑贴阳性率19.6%,常见致敏原依次为:依托酚那酯(6.5%)、癸基葡糖苷(6.5%)、甲酚曲唑三硅氧烷(4.3%)。结论:防腐剂、香料、重金属、乳化剂、抗氧化剂、表面活化剂等原料均可能引起面部接触致敏。面部化妆品皮炎患者还可能存在光敏反应和光变态反应。全面的斑贴试验有助于更好的帮助患者查找致敏原。Objective:To identify the main pathogenic components of facial contact dermatitis patients.Methods:The data of the patients with facial contact dermatitis who underwent patch testing and photopatch testing at our hospital were analyzed retrospectively.Results:51 patients were performed patch testing with the Chinese standard allergens and cosmetic allergens,and the overall positive rate was 96%.The allergens,in order of positivity rate were nickel sulfate(47.1%),cobalt chloride(35.3%),methylisothiazolinone(27.5%),textile dye mixture(19.6%),octyl gallate(19.6%),rosin(13.7%),p-phenylenediamine(13.7%),thiomersal(13.7%),tert butyl hydroquinone(13.7%)and dodecyl gallate(13.7%).46 patients completed photosensitivity test and photopatch test,of them,photosensitivity in 14 cases(30.43%).7 cases were sensitive to UVA(15.22%)and 8 cases were sensitive to UVB(17.39%).The positivity rate of photopatch test was 19.6%.The common allergens of photopatch were etophenate(6.5%),decyl glucoside(6.5%)and crestrezole trisiloxane(4.3%).Conclusion:Preservatives,spices,heavy metals,emulsifiers,surfactants and other raw materials in cosmetics may cause contact sensitization.Patients with facial cosmetic dermatitis may have photosensitive reaction and photoallergy.Comprehensive patch test can provide a reliable reference for patients with facial cosmetic dermatitis.

关 键 词：化妆品 变应原 化妆品皮炎 斑贴试验 光斑贴试验 

分 类 号：R758.22[医药卫生—皮肤病学与性病学]