四甲基胍单晶硅片湿法制绒工艺研究  

STUDY ON WET TEXTURING PROCESS OF MONO-Si WAFERS BASED ON TETRAMETHYLGUANIDINE

作　　者：赵徐禛 张嘉华 康桥 黄仕华[2] Zhao Xuzhen;Zhang Jiahua;Kang Qiao;Huang Shihua(Department of Physics,Zhejiang Normal University,Jinhua 321004,China;Department of Materials Science and Engineering,Zhejiang Normal University,Jinhua 321004,China)

机构地区：[1]浙江师范大学物理系,金华321004 [2]浙江师范大学材料科学与工程系,金华321004

出　　处：《太阳能》2022年第7期68-73,共6页Solar Energy

基　　金：浙江省重点研发计划项目(2021C01006)。

摘　　要：首次采用有机碱——四甲基胍替代传统的氢氧化钠或氢氧化钾作为制绒刻蚀剂,邻苯二酚和硅酸钠作为制绒添加剂进行单晶硅片制绒,并通过实验对不同四甲基胍浓度、邻苯二酚浓度、反应温度、反应时间对单晶硅片制绒的影响进行了分析。研究结果表明:制绒后单晶硅片表面的金字塔分布密集、大小均匀;在400~1000 nm的波长范围内,单晶硅片的平均反射率为9.16%,比采用传统的碱醇制绒体系制绒时获得的反射率低;同时,该制绒方法还消除了传统制绒刻蚀液中金属离子对单晶硅片的污染。For the first time,tetramethylguanidine,an organic base,is used to replace the traditional NaOH or KOH as the texturing etchant,and catechol and sodium silicate are used as the texturing additives for mono-Si wafers texturing.The effects of different concentrations of tetramethylguanidine,concentrations of catechol,reaction temperature and reaction time on the texturing of mono-Si wafers were analyzed through experiments.The research results show that the pyramids on the texturing of surface of mono-Si wafers are densely distributed and uniform in size,and the average reflectivity of the mono-Si wafers in the wavelength range of 400~1000 nm is 9.16%,which is lower than that obtained by traditional alkali alcohol texturing system.At the same time,this method can also eliminate the pollution of metal ions in the traditional texturing etching solution to the mono-Si wafer.

关 键 词：四甲基胍 单晶硅片 制绒 反射率 

分 类 号：TM914.41[电气工程—电力电子与电力传动]