SPC技术识别EMC测量系统性能偏离  

Statistical Process Control for Identifying Performance Deviation of EMC Measurement System

作　　者：陈钧 曾博 邓俊泳 张浩明 欧仔强 Chen Jun;Zeng Bo;Deng Junyong

机构地区：[1]威凯检测技术有限公司

出　　处：《安全与电磁兼容》2022年第4期62-66,共5页Safety & EMC

摘　　要：一套理想的EMC测量系统,应该在每次对同一个符合稳定性要求的质控样品进行测试时,只产生“正确”的测量结果,而且随着时间的推移,测量结果也不会发生偏离,始终保持稳定状态。针对EMC测量系统,探讨如何利用统计过程控制技术(SPC技术),结合MINITAB软件来识别EMC测量系统的性能偏离。着重介绍了预控制图、I-MR控制图和X-S控制图三种控制图的具体应用,为EMC检测实验室的日常质量控制提供参考。An ideal EMC measurement system should produce only"correct"measurement results each time when the same quality control sample which meets the stability requirements is used,and the measurement results will not deviate over time,and always remain stable.This paper discusses how to use statistical process control technology(SPC technology)and MINITAB software to identify the performance deviation of EMC measurement system.The application of three control charts,named pre-control chart,I-MR control chart and X-S control chart,is emphatically introduced,which can provide reference for daily quality control of EMC testing laboratory.

关 键 词：统计过程控制 EMC测量系统 性能偏离 

分 类 号：TN03[电子电信—物理电子学]