基于空间光调制器的并行微纳光刻技术研究进展  

Review on the Progress of Parallel Micro/Nano Lithography Based on Spatial Light Modulator

作　　者：匡珺洁 罗宁宁[1,2] 张静雅 王岩磊 熊鑫 孟庆旺 Kuang Junjie;Luo Ningning;Zhang Jingya;Wang Yanlei;Xiong Xin;Meng Qingwang(Key Laboratory of OptoElectronic Information Science and Technology of Jiangxi Province,Nanchang Hangkong University,Nanchang 330063,Jiangxi,China;Jiangxi Engineering Laboratory for OptoElectronic Measuring Technology,Nanchang Hangkong University,Nanchang 330063,Jiangxi,China)

机构地区：[1]南昌航空大学江西省光电信息科学与技术重点实验室,江西南昌330063 [2]南昌航空大学江西省光电检测技术工程实验室,江西南昌330063

出　　处：《激光与光电子学进展》2022年第11期126-140,共15页Laser & Optoelectronics Progress

基　　金：国家自然科学基金项目(61464008,61704070)。

摘　　要：并行微纳光刻技术是实现微结构快速制造的重要技术手段。在简要介绍并行微纳光刻技术原理和优势的基础上,重点对基于空间光调制器的并行微纳光刻技术进行了分析和论述。按照对入射光场的调制作用,分多焦点和投影并行微纳光刻两类综述了其技术原理和研究进展。最后对两类基于空间光调制器的并行微纳光刻技术的现状及存在问题进行了归纳总结,并对它们的发展前景进行了展望。Parallel micro/nano lithography is essential for rapidly fabricating microstructures.This review briefly introduces the principle and advantages of parallel micro/nano lithography and then analyzes and discusses spatial light modulator(SLM)-based parallel micro/nano lithography.In terms of modulation to incident light,the principle and progress of SLMbased parallel micro/nano lithography(which is divided into two types,i.e.,multifocus parallel lithography and projection parallel lithography)are reviewed.This review summarizes the current situation,existing problems,and future prospects of these two types of SLMbased parallel micro/nano lithography.

关 键 词：并行微纳光刻 微结构 空间光调制器 多焦点 投影并行 

分 类 号：TN305.2[电子电信—物理电子学]