Al含量对磁控溅射TiAlN薄膜耐蚀性能的影响  

Effects of Al Contents on Corrosion Behavior of TiAlN Films by Magnetron Sputtering

作　　者：宫名 GONG Ming(College of Materials Science and Engineering,Jiamusi University,Jiamusi Heilongjiang 154007,China)

机构地区：[1]佳木斯大学材料科学与工程学院,黑龙江佳木斯154007

出　　处：《佳木斯大学学报（自然科学版）》2022年第4期125-127,147,共4页Journal of Jiamusi University：Natural Science Edition

摘　　要：Al元素掺杂的TiN薄膜具有极高的硬度和耐蚀性能,可用于多种金属基体的表面防护。本文采用直流反应磁控溅射方法,选取Al原子掺杂,以靶材中Al原子比为变量,制备了不同含Al量的TiAlN薄膜。采用涂层附着力划痕实验和电化学腐蚀试验评估了Al原子掺杂比例对TiAlN薄膜结合性能和耐蚀性能的影响。结果表明:随着Al原子掺杂比例的增加,薄膜结晶度提高,晶粒尺寸增大,耐蚀性能提高。40%Al掺杂的薄膜的耐蚀性最好,但与基体的结合性能略有下降,而30%Al掺杂薄膜与基体结合性能最好。TiN films doped with Al element have high hardness and corrosion resistance,which can significantly improve the surface corrosion resistance of various metals.In this paper,TiAlN films containing different amounts of Al were prepared by DC reactive magnetron sputtering,and Al atom ratio in alloy target as variable.The effects of Al doping ratio on the bonding properties and corrosion resistance of the TiAlN films were evaluated by coating adhesion scratch tester and electrochemical workstation.With an increase of Al doping ratio,the grain size and crystalline increased,and the corrosion resistance was also improved.The 40% Al doped film presented the best corrosion resistance among the four groups,but its bonding strength decreased slightly.Whereas the film with 30%Al doping possessed the best bonding property.

关 键 词：TiAlN膜 掺杂 附着力 耐蚀性能 

分 类 号：TG174.4[金属学及工艺—金属表面处理] TB79[金属学及工艺—金属学]