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作 者:Jingyi LIU Xia AN Gensong LI Zhexuan REN Ming LI Xing ZHANG Ru HUANG
机构地区:[1]Institute of Microelectronics,Peking University,Beijing 100871,China
出 处:《Science China(Information Sciences)》2022年第8期291-292,共2页中国科学(信息科学)(英文版)
基 金:supported by National Natural Science Foundation of China (Grant Nos. 61421005, 61927901, 61434007);111 Project (Grant No. B18001)。
摘 要:Dear editor,Germanium(Ge) has been considered as a promising candidate of channel material for sub-7 nm owing to its high carrier mobility and good compatibility with conventional Si CMOS process [1]. Although Ge-based technology is still under development and not in massive production, it is quite meaningful to explore its single event effect(SEE) before potential space applications.
关 键 词:meaningful EDITOR MASSIVE
分 类 号:TN249[电子电信—物理电子学]
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