废蚀刻液净化制工业磷酸关键参数的研究  

Study on Key Parameters of Industrial Phosphoric Acid from Waste Etching Solution Purification

作　　者：段利中 邓国平 DUAN Li-zhong;DENG Guo-ping(Huanggang TCL Environment Technology Co.,Ltd.,Huanggang 438000,China)

机构地区：[1]黄冈TCL环境科技有限公司,湖北黄冈438000

出　　处：《硫磷设计与粉体工程》2022年第4期19-23,I0001,共6页Sulphur Phosphorus & Bulk Materials Handling Related Engineering

摘　　要：面板半导体行业中产生大量难以处理的磷酸基废蚀刻液,采用传统无害化处理工艺,既浪费资源又增加了生产成本。试验采用组合萃取反萃工艺净化废蚀刻液制得合格品工业磷酸,研究了萃取相比、萃取时间、反萃时间、反萃相比、反萃温度和反萃后静置时间等关键参数对磷酸收率的影响,确定了该组合萃取反萃工艺的最佳生产条件,为指导工业生产奠定了坚实的理论基础。With large quantities of phosphate⁃based waste etching solution produced in the panel semiconductor industry,which is difficult to be treated,the traditional harmless treatment technology not only wastes resources but also increases production cost.The experiment is carried out with combined ex⁃traction and stripping process to purify waste etching solution and prepare qualified industrial phosphoric acid.The influences of key parameters such as ex⁃traction O/A ratio,extraction time,stripping time,stripping O/A ratio,stripping temperature and standing time after stripping on the yield of phosphoric acid are studied.The optimal production conditions for the combined extraction and stripping process are determined,laying a solid theoretical foundation for industrial production guidance.

关 键 词：工业磷酸 废蚀刻液 废酸净化 萃取+反萃 试验研究 

分 类 号：TQ126.35[化学工程—无机化工]