检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
作 者:Zhi-Dong Chen Chong Wang Wei He Ming Li
机构地区:[1]School of petrochemical engineering,Changzhou University,Changzhou 213164,Jiangsu,China [2]School of Materials and Energy,University of Electronic Science and Technology of China [3]School of Materials Science and Engineering,Shanghai Jiao Tong University,Shanghai,200240,China
出 处:《电化学》2022年第7期1-3,共3页Journal of Electrochemistry
摘 要:Electroplating is a process using electric current to deposit a layer of metal(s),which is an indispensable technique in the manufacture of integrated circuits and micro-nano electronic devices.Electroplating for modern electronics is much smaller in scale than the ordinary electroplating processes and relies heavily on foreign technique,such as proprietary materials and equipment.As the competition in the field of chip manufacture intensifies,we realize that there is no choice but to become self-sufficient in such technology,including,but not limited to electroplating technology.
关 键 词:technology. ELECTROPLATING ordinary
分 类 号:TQ153[化学工程—电化学工业]
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:3.139.55.72