Advanced unconventional techniques for sub-100 nm nanopatterning  

作　　者：Mengmeng Guo Zhiyuan Qu Fanyi Min Zheng Li Yali Qiao Yanlin Song 

机构地区：[1]Key Laboratory of Green Printing,Institute of Chemistry,Chinese Academy of Sciences(ICCAS),Beijing,PR China [2]State Key Laboratory of Trauma,Burn and Combined Injury,Institute of Burn Research,Southwest Hospital,Army Medical University,Chongqing,PR China

出　　处：《InfoMat》2022年第8期25-53,共29页信息材料（英文）

基　　金：Beijing National Laboratory for Molecular Sciences,Grant/Award Numbers:2019BMS20003,BNLMS-CXXM-202005;CAS-VPST Silk Road Science Fund 2022,Grant/Award Number:121111KYSB20210006;K.C.Wong Education Foundation,China Postdoctoral Science Foundation,Grant/Award Number:2020M670466;External Cooperation Program of Chinese Academy of Sciences,Grant/Award Number:GJHZ201948;the National Key R&D Program of China,Grant/Award Numbers:2018YFA0208501,2018YFA0703200;the National Nature Science Foundation of China,Grant/Award Numbers:22002171,22175185,51773206,51803217,51961145102,52003273,52003276,91963212。

摘　　要：Patterned nanostructures with ultrasmall features endow functional devices with unique nanoconfinement and performance enhancements.The increasing demand for miniaturization has stimulated the development of sub-100 nm nanopatterning techniques.Beyond conventional lithography—which is limited by unavoidable factors—advanced patterning techniques have been reported to produce nanoscale features down to molecular or even atomic scale.In this review,unconventional techniques for sub-100 nm nanopatterning are discussed,in particular the principles by which to achieve the desired patterns(among other important issues).Such techniques can be classified into three categories:template-replica,template-induced,and template-free techniques.Moreover,multi-dimensional nanostructures consist of various building materials,the unique properties of which are summarized.Finally,the remaining challenges and opportunities for large-scale patterning,the improvement of device perfor-mance,the multi-dimensional nanostructures of biocompatible materials,molecular-scale patterning,and the carbon footprint requirements for future nanofabrication processes are discussed.

关 键 词：functional devices high resolution NANOCONFINEMENT nanostructure patterning techniques sub-100 nm unconventional lithography 

分 类 号：TB3[一般工业技术—材料科学与工程]