Automatic Measurement of Silicon Lattice Spacings in High-Resolution Transmission Electron Microscopy Images Through 2D Discrete Fourier Transform and Inverse Discrete Fourier Transform  

作　　者：Fang Wang Yushu Shi Shu Zhang Xixi Yu Wei Li 

机构地区：[1]National Institute of Metrology,Beijing,100029,China [2]Shenzhen Institute for Technology Innovation,National Institute of Metrology,Shenzhen,518038,China

出　　处：《Nanomanufacturing and Metrology》2022年第2期119-126,共8页纳米制造与计量（英文）

基　　金：supported by Basic Scientific Research Operating Fund of NIM(Grant No.AKYZD2007-1).

摘　　要：Line width(i.e.,critical dimension,CD)is a crucial parameter in integrated circuits.To accurately control the CD in manufacturing,a reasonable CD measurement algorithm is required.We develop an automatic and accurate method based on a two-dimensional discrete Fourier transform for measuring the lattice spacings from high-resolution transmission electron microscopy images.Through the two-dimensional inverse discrete Fourier transform of the central spot and a pair of symmetrical diffraction spots,an image containing only a set of lattice spacings is obtained.Then,the pixel span of the lattice spacing is calculated through the centre of gravity method.Finally,we estimate the standard CD value according to the half-intensity method.The silicon crystal lattice constant guarantees the accuracy and traceability of the CD value.Through experiments,we demonstrate the efficiency of the proposed method,which can be conveniently applied to accurately measure CDs in practical applications.

关 键 词：Transmission electron microscopy Line width Crystal lattice constant TRACEABILITY 

分 类 号：O17[理学—数学]