Atomic layer deposition for advanced nanomanufacturing  

作　　者：CAO Kun LIU Xiao YANG Fan CHEN Rong 

机构地区：[1]State Key Laboratory of Digital of Manufacturing Equipment and Technology,School of Mechanical Science and Engineering,Huazhong University of Science and Technology,Wuhan 430074,China

出　　处：《Science China(Technological Sciences)》2022年第9期2218-2220,共3页中国科学（技术科学英文版）

基　　金：supported by the National Natural Science Foundation of China(Grant Nos.51835005,51871103,51801067,52103257,and 51911540476);the National Key R&D Program of China(Grant No.2020YFB2010400);the Hubei Province Natural Science Foundation for Innovative Research Groups(Grant Nos.2020CFA030 and 2021CFB066);the Independent Innovation Research Fund of Huazhong University of Science and Technology(Grant Nos.2019kfy XMBZ025 and 2021XXJS044);Tencent Foundation。

摘　　要：Moore’s law drives the semiconductor industry to continuously shrink the critical size of transistors, however, the current fabrication processes still have challenges in future downscaling. It is a trade-off to improve the controllability for atomic-scale manufacturing with high accuracy and efficiency. Besides further downscaling, flexible electronics including flexible processors, displays.

关 键 词：LAYER shrink continuously 

分 类 号：TB383.1[一般工业技术—材料科学与工程] TN05[电子电信—物理电子学]