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作 者:李栋 潘永强[1] 刘欢[1] 郑志奇 周泽林 LI Dong;PAN Yongqiang;LIU Huan;ZHENG Zhiqi;ZHOU Zelin(School of Photoelectric Engineering,Xi'an Technological University,Xi'an 710021,China)
机构地区:[1]西安工业大学光电工程学院,陕西西安710021
出 处:《应用光学》2022年第5期980-985,共6页Journal of Applied Optics
基 金:陕西省重点研发计划(2019ZDLGY16-01);陕西省教育厅重点项目(22JS***)。
摘 要:超薄银薄膜具有高柔韧性和优良的光电性能,是用于透明导电电极的潜在材料。通过电阻热蒸发技术以金属铝作为浸润层制备超薄银透明导电薄膜。引入铝浸润层降低银薄膜的阈值厚度,使银薄膜在K9玻璃基底上以尽可能低的厚度达到连续。对不同厚度铝浸润层上银薄膜方块电阻进行测试,经SEM图像验证后得出,1 nm铝浸润层对银薄膜具有较好的浸润效果。随后采用相同的工艺在1 nm铝浸润层上制备了不同厚度的银薄膜,透过率和方阻测试结果表明,1 nm铝浸润层上制备的10 nm银薄膜方阻值可达到13Ω/,其在0.4μm~2.5μm波段内透过率可达到50%以上。The ultra-thin silver film is a potential material used for transparent conductive electrodes because of its high flexibility and excellent photoelectric properties. The ultra-thin silver transparent conductive films were prepared by resistance thermal evaporation technology using aluminum as infiltration layer. The threshold thickness of the silver film was reduced by introducing an aluminum infiltration layer, so that the silver film could be continuous on the K9 glass substrate at the lowest possible thickness. The resistance of silver film squares on aluminum infiltration layers with different thicknesses was tested, and verified by scanning electron microscope(SEM) images that the 1 nm aluminum infiltration layer had better infiltration effect on silver film. Then, the silver films with different thicknesses were prepared on 1 nm aluminum infiltration layer by the same process. The transmittance and square resistance test results show that the square resistance of 10 nm silver film prepared on 1 nm aluminum infiltration layer can reach 13 Ω/□, and the transmittance can reach more than 50% in the range of 0.4 μm~2.5 μm.
分 类 号:TN209[电子电信—物理电子学] O484[理学—固体物理]
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