多层薄膜的二次电子发射蒙特卡罗模拟研究  

The study on Monte Carlo simulation of secondary electron emission for multilayer thin films

作　　者：彭敏[1] 程文杰[1] 曹猛[1] PENG Min;CHENG Wenjie;CAO Meng(Key Laboratory for Physical Electronics and Devices of the Ministry of Education,Department of Electronic Science and Technology,Xi’an Jiaotong University,Xi’an 710049,China)

机构地区：[1]西安交通大学电子与信息学部电子物理与器件教育部重点实验室,西安710049

出　　处：《空间电子技术》2022年第4期72-78,共7页Space Electronic Technology

基　　金：国家自然科学基金(编号:61971342,62101434)。

摘　　要：为了深入研究多层薄膜材料中二次电子发射这一影响部件微放电效应的重要物理过程,基于金属表面多代二次电子发射蒙特卡罗模型,建立了多层薄膜二次电子发射蒙特卡罗模型,并构建了多层薄膜的平面和矩形沟槽这两种表面结构。通过对这两种表面的多层薄膜二次电子发射系数进行蒙特卡罗模拟,并对不同薄膜厚度的二次电子发射系数模拟结果进行分析,验证了多层薄膜抑制二次电子产额的实验效果,并得出抑制效果与多层薄膜厚度和表面结构有关的结论。In order to deeply study the important physical process of secondary electron emission(SEE)in multilayer thin film materials that affects the multipactor effect in components,in this paper,a Monte Carlo(MC)model of SEE for multilayer thin films was established based on the MC model of multi-generation SEE on metal surface,and two surface structures of plane and rectangular grooves were constructed.Through the MC simulation of secondary electron yield(SEY)of multilayer films on these two surfaces and the analysis on the SEY simulative results of multilayer films with different film thicknesses,observations of the SEY suppression was verified.It was also concluded that the suppression effect is related to the thickness and surface structure of the multilayer films.

关 键 词：二次电子发射 多层薄膜 蒙特卡罗模拟 

分 类 号：V443[航空宇航科学与技术—飞行器设计] O462.2[理学—电子物理学]