高集成度多标记光刻版版图的快速处理技术  

Rapidly processed technology of highly integrated and multi-label photolithography

作　　者：黄翔宇 马协力 金焱骅 Huang Xiangyu;Ma Xieli;Jin Yanhua(China Power Guoji South Group Co.,Ltd.,Nanjing 211153,China)

机构地区：[1]中电国基南方集团有限公司,江苏南京211153

出　　处：《电子技术应用》2022年第9期67-69,74,共4页Application of Electronic Technique

摘　　要：介绍了一种高集成度多标记光刻版版图的快速处理技术。其中包括以下四个模块:chip芯片排布模块、标记排布模块、芯粒数统计模块和自动版号模块。在版图编辑工具L-edit中使用这些模块可以大幅提升微光刻中的高集成度多标记光刻版版图的排布效率并提高准确度,从而有效缩短掩膜版的生产周期。This paper introduces a rapidly processed technology of highly integrated and multi-label photolithography.It includes the following four modules:arranged module of chips,arranged module of multi-label,chips′counting module and automatic module of photolithography′s mark.Using these modules in Layout-edit(L-edit)can greatly improve the efficiency and accuracy of highly integrated and multi-label photolithography layout.Finally,it can shorten the production cycle of photolithography effectively.

关 键 词：微光刻 高集成度 快速排布 光刻版 

分 类 号：TN405[电子电信—微电子学与固体电子学]