大气压空气滑动弧等离子体发射光谱诊断  

Emission Spectroscopy Diagnosis of Air Gliding Arc Plasma Under Atmospheric Pressure Condition

作　　者：杨昆 陈雷 程凡翀 裴欢 刘桂铭 王保怀 曾文 YANG Kun;CHEN Lei;CHENG Fan-chong;PEI Huan;LIU Gui-ming;WANG Bao-huai;ZENG Wen(School of Aero-engine,Shenyang Aerospace University,Shenyang 110136,China)

机构地区：[1]沈阳航空航天大学航空发动机学院,辽宁沈阳110136

出　　处：《光谱学与光谱分析》2022年第10期3006-3011,共6页Spectroscopy and Spectral Analysis

基　　金：国家自然科学基金项目(51409158,51676132)资助。

摘　　要：为了解Ar添加对空气滑动弧等离子体的影响,在放电频率f=10 kHz、空气流量q=15 L·min^(-1)、1 atm下进行了Ar体积流量q_(Ar)对空气-Ar滑动弧放电的影响试验研究,重点分析了不同q_(Ar)及调压器电压U_(调)下空气等离子体的活性粒子种类、电子密度及振动温度。结果表明,滑动弧等离子体区的主要活性粒子为OH、N_(2)的第二正带系、Hα、O原子、ArⅠ及ArⅡ原子,其中O原子及ArⅠ、ArⅡ原子的相对光谱强度明显较强;随着q_(Ar)的增大,O(777.4 nm)的相对光谱强度先缓慢增长、再快速增大到极大值、随后缓慢减小并趋于稳定,O(777.4 nm)的相对光谱强度在1580~6650 a.u.之间变化;随U_(调)增大,O(777.4 nm)的相对光谱强度增大,且电压对其影响受q_(Ar)的影响:在高q_(Ar)(4~6 L·min^(-1))工况下,O(777.4 nm)的相对光谱强度变化趋势较大;Ar的加入使OH(313.4 nm)相对光谱强度有明显增加,OH(313.4 nm)相对光谱强度在235~311 a.u.之间变化;随着q_(Ar)的增大,OH(313.4 nm)相对光谱强度先增大再减小并趋于稳定。在较低U(100 V)工况下,OH(313.4 nm)的相对光谱强度随q_(Ar)变化不明显;而随着U_(调)增大,OH(313.4 nm)的相对光谱强度随q_(Ar)变化明显:在低q_(Ar)(0~4 L·min^(-1))工况下,OH(313.4 nm)的相对光谱强度随q_(Ar)增大而明显增大。利用Hα谱线做高斯拟合进行电子密度分析计算,得到电子密度在1.15~2.04×10^(17)cm^(-3)之间。空气流量一定,Ar的加入能显著增加电子密度:在q_(Ar)为0~4 L·min^(-1)工况下,电子密度增长趋势明显,随着q_(Ar)的继续增大,在较低U_(调)(100~120 V)工况下,电子密度先增大再减小并趋于稳定;在较高U_(调)(140~160 V)工况下,电子密度先增大再缓慢增大并趋于稳定。U_(调)变化也会对电子密度造成影响,电子密度随U_(调)增大而增大,且随U_(调)增大,电子密度增长趋势变快。To understand the effect of argon on the air gliding arc plasma,an air gliding arc plasma was generated at a discharge frequency of 10 kHz and an atmospheric pressure with q_(Ar)=15 L·min^(-1)to study the effect of Ar volume flow on air-Ar gliding arc discharge.And then focused on the analysis of the active particle species,electron density and vibration temperature of air gliding arc plasma under different Ar volumetric flow rates and voltage of the voltage regulator.The results show that the main active particles in the gliding arc plasma region are OH,the second positive band system of N_(2),H_(α),O atoms,ArⅠand ArⅡatoms.It is found that the relative spectral intensity of O and ArⅠ,ArⅡatoms is strong.With the increase of Ar volume flow,the relative spectral intensity of O(777.4 nm)increases slowly at first,then quickly increases to a maximum value,then slowly decreases and tends to stabilizes,and the relative spectral intensity of O(777.4 nm)varies between 1580~6650 a.u.The relative spectral intensity of O(777.4 nm)increases as the voltage of the voltage regulator increases.Moreover,the influence of voltage of the voltage regulator on the relative spectral intensity of O(777.4 nm)is affected by the volume flow of Ar:The relative spectral intensity of O(777.4 nm)changes significantly under high Ar volume flow(4~6 L·min^(-1)).The addition of Ar significantly increases the relative spectral intensity of OH(313.4 nm),the relative spectral intensity of OH(313.4 nm)varies between 235~311 a.u.As the volume flow of Ar increases,the relative spectral intensity of OH(313.4 nm)first increases and then decreases and tends to stabilize.At a lower voltage(100 V),the relative spectral intensity of OH(313.4 nm)does not change significantly with the volume flow of Ar.As U_(R) increases,the relative spectral intensity of OH(313.4 nm)changes significantly with the volume flow of Ar:at low Ar volume flow(0~4 L·min^(-1)),the relative spectral intensity of OH(313.4 nm)increases significantly with the increase of Ar volu

关 键 词：滑动弧放电 发射光谱法 振动温度 电子密度 OH O 

分 类 号：O433.1[机械工程—光学工程]