具有低摩擦因数的a-C:H薄膜研究  

a-C:H Film with Low Friction Coefficient

作　　者：尹萍妹 刘政宇 尚伦霖 曹学乾 鲁志斌[1,2] 张广安 YIN Pingmei;LIU Zhengyu;SHANG Lunlin;CAO Xueqian;LU Zhibin;ZHANG Guangan(Lanzhou Institute of Chemical Physics,CAS,Lanzhou 730000,China;University of Chinese Academy of Sciences,Beijing 100049,China)

机构地区：[1]中国科学院兰州化学物理研究所,兰州730000 [2]中国科学院大学,北京100049

出　　处：《真空与低温》2022年第5期542-548,共7页Vacuum and Cryogenics

基　　金：甘肃省青年科技基金(21JR7RA089);国家重点研发计划(2018YFB0703801)。

摘　　要：a-C:H薄膜有内应力大、热稳定性差、大气环境下摩擦因数高(0.1~0.4)等一些固有缺陷。采用等离子体辅助化学气相沉积技术,以乙炔和六甲基二硅氧烷为反应前驱体制备了具有低摩擦因数的硅氧共掺a-C:H薄膜。利用扫描电镜、拉曼光谱、纳米压痕及划痕分别研究了薄膜的微观结构和力学性能。结果表明,硅氧共掺a-C:H薄膜具有典型的非晶碳结构,并且展现出较高的硬度和弹性模量以及良好的膜基结合力,大气下的摩擦因数介于0.04~0.08之间,气压为10 kPa和5 kPa时摩擦因数可低至0.02。薄膜的低摩擦性能主要来源于薄膜本身的特性(硅氧的掺杂)和服役环境中大气压力的共同作用。Hydrogenated amorphous carbon(a-C:H)films are widely used in industry owing to their unique combination of properties such as high hardness,low friction,low wear and excellent chemical inertness.However,a-C:H films also show some inherent defects,which includes high internal stress,poor thermal stability,high coefficient of friction(0.1~0.4)in atmospheric environment.In this study,Si and O co-doped a-C:H films with low friction coefficients were deposited by plasma-assisted chemical vapor deposition(PACVD)technology using acetylene(CH)and hexamethyldisiloxane(HMDSO)as precursors.The microstructure and mechanical properties of Si and O co-doped a-C:H film were characterized by SEM,Raman,nano-indentation and scratch test.The results show that the Si and O co-doped a-C:H exhibits a typical structure of amorphous carbon,high hardness and elastic modulus,and good adhesion between film and substrate.The friction coefficients of the Si and O co-doped a-C:H films vary in the range of 0.04~0.08 in the atmospheric environment,and it is as low as 0.02 when the pressure of the atmospheric environment is 10 kPa and 5 kPa,indicating that the low friction coefficient of Si and O co-doped a-C:H film is associated to the combined effect of co-doping of Si and O dopants and the pressure of the service environment.

关 键 词：硅氧共掺a-C:H薄膜 等离子体辅助化学气相沉积 六甲基二硅氧烷 低摩擦因数 

分 类 号：O484[理学—固体物理]