非离子型紫外光敏树脂合成与性能研究  

Synthesis and Properties of Nonionic UV Photosensitive Resins

作　　者：汪霞 谭俊玉 马国庆 艾照全[1,2] 王彩霞 WANG Xia;TAN Jun-yu;MA Guo-qing;AI Zhao-quan;WANG Cai-xia(College of Chemistry and Chemical Engineering,Hubei University,Wuhan 430062;Wuhan Qianglihe New Materials Co.,LTD.,Wuhan 430062)

机构地区：[1]湖北大学化学化工学院 [2]武汉强力荷新材料有限公司,武汉430062

出　　处：《胶体与聚合物》2022年第3期122-125,共4页Chinese Journal of Colloid & Polymer

摘　　要：通过Wittig反应合成带双键的非离子型产酸单体,将其与甲基丙烯酸叔丁酯在四氢呋喃中回流共聚,以偶氮二异丁腈作为引发剂,制得非离子型紫外光敏树脂。通过红外光谱、核磁和热重分析对光敏树脂的结构与性能进行表征。同时研究了引发剂种类和用量对光敏树脂的分子量和分子量分布的影响。Nonioni c acid-producing monomer with double bond was synthesized by Wittig reaction.The photosensitive resin was prepared by copolymerization of nonionic acid-producing monomer with tert-butyl methacrylate in tetrahydrofuran through reflux, and azodiisobutyronitrile was used as initiator. The structure and properties of photosensitive resin were characterized by infrared spectroscopy, nuclear magnetic resonance and thermogravimetric analysis. The effects of initiator type and dosage on molecular weight and molecular weight distribution of photosensitive resin were also studied.

关 键 词：光敏树脂 光致产酸剂 甲基丙烯酸叔丁酯 

分 类 号：TQ317.4[化学工程—高聚物工业]