40CrNi2MoA合金钢阴极电弧等离子沉积TiN/TiAlN薄膜及其性能  

Preparation of TiN/TiAlN composite film on 40CrNi2MoA alloy steel surface by cathodic arc plasma deposition and its properties

作　　者：邓玉娟[1,3] 叶剑刚[2] 祝惠一 魏小华[1] DENG Yujuan;YE Jian’gang;ZHU Huiyi;WEI Xiaohua(School of Mechanical and Electrical Engineering,Quzhou College of Technology,Quzhou 324000,China;Quzhou Special Equipment Inspection Center,Quzhou 324000,China;College of Mechanical and Vehicle Engineering,Chongqing University,Chongqing 400030,China)

机构地区：[1]衢州职业技术学院机电工程学院,浙江衢州324000 [2]衢州市特种设备检验中心,浙江衢州324000 [3]重庆大学机械与运载工程学院,重庆400030

出　　处：《电镀与涂饰》2022年第19期1351-1355,共5页Electroplating & Finishing

基　　金：国家自然科学基金(61601153);浙江省教育科学规划课题(2019SB065);衢州市科技计划指导性项目(2021058,2021060)。

摘　　要：以40CrNi2MoA钢作为基体,通过阴极电弧等离子体沉积(CPAD)技术制备了TiN、TiAlN和TiN/TiAlN薄膜。通过扫描电镜、X射线衍射仪、纳米压痕仪、原子力显微镜、摩擦磨损试验、洛氏硬度计和电化学分析,对比了3种薄膜的组织结构、纳米硬度、表面粗糙度、耐磨性、附着力和耐蚀性。结果表明,TiN/TiAlN双层膜的综合性能最佳,其附着力为HF1级,摩擦因数为0.455,纳米硬度为36.59 GPa,表面粗糙度(Ra)为0.09μm。TiN,TiAlN,and TiN/TiAlN films were prepared respectively on the surface of 40CrNi2MoA alloy steel by cathodic arc plasma deposition(CAPD).The microstructure,nanohardness,surface roughness,wear resistance,adhesion,and corrosion resistance of the three kinds of films were compared by scanning electron microscopy,X-ray diffraction,nanoindentation,atomic force microscopy,friction and wear test,Rockwell hardness measurement,and electrochemical analysis.The results showed that the double-layered TiN/TiAlN film had the best comprehensive properties as shown by adhesion of HF1 grade,friction factor of 0.455,nanohardness of 36.59 GPa,and surface roughness(Ra)of 0.09μm.

关 键 词：合金钢 阴极电弧等离子体沉积 氮化钛 氮化铝钛 耐磨性 耐蚀性 

分 类 号：TQ153.2[化学工程—电化学工业]