薄膜光学常数的原位测定  

On-site determination of optical constants for thin films

作　　者：谢茂彬 吴智勇 崔恒毅 赵新潮 玄志一 刘清权 刘锋 孙聊新 王少伟[1,3,4,5,7] XIE Mao-Bin;WU Zhi-Yong;CUI Heng-Yi;ZHAO Xin-Chao;XUAN Zhi-Yi;LIU Qing-Quan;LIU Feng;SUN Liao-Xin;WANG Shao-Wei(State Key Laboratory of Infrared Physics,Shanghai Institute of Technical Physics,Chinese Academy of Sciences,Shanghai 200083,China;Department of Physics,Shanghai Normal University,Shanghai 200234,China;Shanghai Engineering Research Center of Energy-Saving Coatings,Shanghai 200083,China;Shanghai Research Center for Quantum Sciences,Shanghai 201315,China;University of Chinese Academy of Sciences,Beijing 100049,China;School of Physical Science and Technology,ShanghaiTech University,Shanghai 201210,China;Nantong Academy of Intelligent Sensing,Nantong 226000,China)

机构地区：[1]中国科学院上海技术物理研究所红外物理国家重点实验室,上海200083 [2]上海师范大学物理系,上海200234 [3]上海节能镀膜玻璃工程技术研究中心,上海200083 [4]上海量子科学研究中心,上海201315 [5]中国科学院大学,北京100049 [6]上海科技大学物质科学与技术学院,上海201210 [7]南通智能传感研究院,江苏南通226000

出　　处：《红外与毫米波学报》2022年第5期888-893,共6页Journal of Infrared and Millimeter Waves

基　　金：fumded by Natuonal key R&D Program of China(2021YFA07115500);National Notural Science Foundation of China(11874376)。

摘　　要：薄膜的光学常数(折射率和消光系数)精度直接影响设计和制造的光学器件的性能。大多数光学常数的测定方法较为复杂,不能直接应用在镀膜过程中。提出了一种薄膜光学常数原位实时测量的方法,通过监测沉积材料的透射率可以快速准确地测量光学常数。测量了高吸收材料Si、低吸收材料Ta_(2)O_(5)和超低吸收材料SiO_(2)的近红外光学常数,用这种方法测得光学常数分别为n=3.22,k=4.6×10^(-3),n=2.06,k=1.3×10^(-3)和n=1.46,k=6.6×10^(-5)。该方法适用于强吸收材料和弱吸收材料光学常数的测定,为在线精确测量薄膜的光学常数提供了一种有效的方法,对设计和制造高质量的光学器件具有重要意义。The optical constants(refractive index and extinction coefficient)accuracy of thin films directly affects the properties of designed and fabricated optical devices.Most of the determination methods of optical constants are complex and cannot be applied during the film depositing process.In this paper,an optical constants determi⁃nation method of thin films on-site is proposed.By monitoring the transmittance of depositing materials,this method can rapidly and accurately determine the optical constants on-site.For demonstration,the near-infrared optical constants of high-absorption material Si,low-absorption material Ta_(2)O_(5) and ultra-low-absorption material SiO_(2) are obtained as n=3.22,k=4.6×10^(-3),n=2.06,k=1.3×10^(-3) and n=1.46,k=6.6×10^(-5) respectively by this method.It reveals that this method is suitable for determining both strong and weak absorption materials’optical constants.It provides an effective way for precisely determining optical constants on-site,which is meaningful for the design and fabrication of high-quality optical devices.

关 键 词：光学常数 近红外 薄膜 原位 测定 

分 类 号：O484.41[理学—固体物理]