大尺寸掩膜版显影工艺研究  

Study on Developing Process of Large-size Mask

作　　者：张华超 葛翔 熊启龙 ZHANG Huachao;GE Xiang;XIONG Qilong(Hefei Qingyi Photomask Limited Company,Hefei 230011,CHN)

机构地区：[1]合肥清溢光电有限公司,合肥230011

出　　处：《光电子技术》2022年第2期129-132,共4页Optoelectronic Technology

摘　　要：对大尺寸(520 mm×800 mm及以上)掩膜版生产过程中的连续喷雾影喷液方式和狭缝液帘影喷液方式进行对比分析,通过实验及生产过程的监控,得出了两种显影喷液方式的优缺点。综合对比得出,在掩膜版的生产过程中,选择狭缝液帘显影喷液方式最佳。The Spray development spray mode and Slit development spray mode in the production process of large-size mask were compared and analyzed.Through experiments and production process monitoring,the advantages and disadvantages of the two development spray modes were obtained.Through comprehensive comparison,it was concluded that Slit development spray mode was better in the production process of mask plate.

关 键 词：大尺寸掩膜版 显影工艺 显影喷嘴 狭缝液帘 均匀性 

分 类 号：TN305[电子电信—物理电子学]