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作 者:林晓波 张瑞 王勇 付好强 晁全贵 LIN Xiao-bo;ZHANG Rui;WANG Yong;FU Hao-qiang;CHAO Quan-gui(Key Laboratory of Science and Technology on High Power Microwave Sources and Technologies,Aerospace Information Research Institute,Chinese Academy of Sciences,Beijing 100190,China;School of Electronic,Electrical and Communication Engineering,University of Chinese Academy of Sciences,Beijing 100049,China)
机构地区:[1]中国科学院空天信息创新研究院高功率微波源与技术重点实验室,北京100190 [2]中国科学院大学电子电气与通信工程学院,北京100049
出 处:《真空电子技术》2022年第5期55-58,共4页Vacuum Electronics
摘 要:介绍了一种应用于S波段同轴腔高功率多注速调管的电子枪设计方案。该电子枪总电子注数目为40个(内层19个,外层21个),工作电压为60 kV,总电流为300 A(平均分配在40个电子注上),单注导流系数为0.51μP,总导流系数为20.4μP,设计的阴极电流发射密度小于12 A/cm^(2),电子枪内最大场强为16.6 kV/mm。为使系统小型化,采用周期反转永磁聚焦系统约束电子注,聚焦系统由四组磁钢形成三个磁场均匀区,三个均匀区的磁场逐级增大,最小磁场强度为0.11 T,最大磁场强度为0.12 T。采用三维计算软件对电子注静电轨迹、磁场分布及聚焦轨迹进行了计算和优化,设计的多注电子枪电子注通过率达到了100%。This paper introduces the design scheme of an electron gun for S-band coaxial cavity high power multi-beam klystrons.The total electron beams of the electron gun are 40(19 in inner layer and 21 in outer layer),the working voltage is 60 kV,the total current is 300 A(evenly distributed among 40 electron beams),the single beam perveance is 0.51μP,and the total perveance is 20.4μP.The cathode loading of the gun is less than 12 A/cm^(2),and the maximum electric field intensity in the electron gun is 16.6 kV/mm.In order to miniaturize the system,a periodic reversal permanent magnet focusing system is used to constrain the electron beams.The focusing system consists of four groups of magnetic steels to form three uniform magnetic fields,and the magnetic field intensities in the three fields increase step by step.The minimum magnetic field intensity is 0.11 T and the maximum one is 0.12 T.The electrostatic trajectories,magnetic field distribution and focusing trajectories of the electron beams are calculated and optimized by using three-dimensional calculation software,and the electron transmittance of the designed multi-beam electron gun reaches 100%.
关 键 词:多注速调管 电子枪 多注电子枪 周期反转永磁聚焦系统
分 类 号:TN122[电子电信—物理电子学]
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